Fabrication of Stacked MoS 2 Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer

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Title
Fabrication of Stacked MoS 2 Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer
Author(s)
Hye MinOh; Hyojung Kim; Hyun Kim; Mun Seok Jeong
Publication Date
2019-04
Journal
SCIENTIFIC REPORTS, v.9, no., pp.5900 -
Publisher
NATURE PUBLISHING GROUP
Abstract
© 2019, The Author(s). We fabricated the stacked bilayer molybdenum disulfide (MoS 2 ) by using reduced graphene oxide (rGO) as a spacer for increasing the optoelectronic properties of MoS 2 . The rGO can decrease the interlayer coupling between the stacked bilayer MoS 2 and retain the direct band gap property of MoS 2 . We observed a twofold enhancement of the photoluminescence intensity of the stacked MoS 2 bilayer. In the Raman scattering, we observed that the E 1 2g and A 1g modes of the stacked bilayer MoS 2 with rGO were further shifted compared to monolayer MoS 2 , which is due to the van der Waals (vdW) interaction and the strain effect between the MoS 2 and rGO layers. The findings of this study will expand the applicability of monolayer MoS 2 for high-performance optoelectronic devices by enhancing the optical properties using a vdW spacer
URI
https://pr.ibs.re.kr/handle/8788114/5997
ISSN
2045-2322
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > Journal Papers (저널논문)
Files in This Item:
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