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Photo-oxidative Crack Propagation in Transition Metal Dichalcogenides

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Title
Photo-oxidative Crack Propagation in Transition Metal Dichalcogenides
Author(s)
Andrew Ben-Smith; Soo Ho Choi; Stephen Boandoh; Lee, Byung Hoon; Vu, Duc Anh; Nguyen, Huong Thi Thanh; Adofo, Laud Anim; Jin, Jeong Won; Kim, Soo Min; Young Hee Lee; Ki Kang Kim
Publication Date
2024-01
Journal
ACS Nano, v.18, no.4, pp.3125 - 3133
Publisher
American Chemical Society
Abstract
Monolayered transition-metal dichalcogenides (TMDs) are easily exposed to air, and their crystal quality can often be degraded via oxidation, leading to poor electronic and optical device performance. The degradation becomes more severe in the presence of defects, grain boundaries, and residues. Here, we report crack propagation in pristine TMD monolayers grown by chemical vapor deposition under ambient conditions and light illumination. Under a high relative humidity (RH) of ∼60% and white light illumination, the cracks appear randomly. Photo-oxidative cracks gradually propagated along the grain boundaries of the TMD monolayers. In contrast, under low RH conditions of ∼2%, cracks were scarcely observed. Crack propagation is predominantly attributed to the accumulation of water underneath the TMD monolayers, which is preferentially absorbed by hygroscopic alkali metal-based precursor residues. Crack propagation is further accelerated by the cyclic process of photo-oxidation in a basic medium, leading to localized tensile strain. We also found that such crack propagation is prevented after the removal of alkali metals via the transfer of the sample to other substrates. © 2024 American Chemical Society.
URI
https://pr.ibs.re.kr/handle/8788114/14897
DOI
10.1021/acsnano.3c08755
ISSN
1936-0851
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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