Hexagonal boron nitride, Chemical vapor deposition, Thin film
Publication Date
2014-05
Journal
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.64, no.10, pp.1605 - 1616
Publisher
KOREAN PHYSICAL SOC
Abstract
Growth of hexagonal boron nitride (hBN), an isomorph of graphene/graphite, has been highlighted
due to its highly insulating and transparent properties, in parallel with highly-conducting
graphene counterpart, which could be useful for numerous applications. Nevertheless, difficulty
arises from the absence of robust synthesis methods that provide large-area and high-quality hBN
with controlled number of layers. In this article, we review the recent development for the synthesis
of hBN with various approaches including liquid-metal, ultra-high-vacuum chemical vapor
deposition (UHVCVD), and low-pressure CVD (LPCVD) methods. Its fundamental physical and
chemical properties and its potential applications are further discussed. We expect that our comprehensive
overview of the synthesis method of hBN will provide a route to find an ultimate method
of synthesizing large-area and high-quality hBN with controlled number of layers.