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나노 구조 물리 연구단
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How Clean Is Clean? Recipes for van der Waals Heterostructure Cleanliness Assessment

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Title
How Clean Is Clean? Recipes for van der Waals Heterostructure Cleanliness Assessment
Author(s)
Isabella Gasparutti; Seung Hyun Song; Michael Neumann; Xu Wei; Kenji Watanabe; Takashi Taniguchi; Young Hee Lee
Publication Date
2020-02
Journal
ACS APPLIED MATERIALS & INTERFACES, v.12, no.6, pp.7701 - 7709
Publisher
AMER CHEMICAL SOC
Abstract
Van der Waals (vdW) heterostructures, artificial stacks of two-dimensional materials, present an exciting platform to explore new physical phenomena and unique applications. An important and increasingly recognized factor limiting the electrical and optical performance of heterostructure samples is the presence of interfacial contamination. In published work reporting various heterostructure fabrication methods, evidence for the cleanliness of samples is often presented as optical and atomic force microscopy images, typically exhibiting a completely flat topography. In this work, we demonstrate that such samples may nonetheless contain a uniformly thin layer of contaminants at the heterostructure interface. As alternatives, we propose two robust visualization methods that are highly sensitive to such residues, based on photoluminescence mapping and on selective solvent diffusion. The detection capability and straightforward implementation of these two imaging techniques make them powerful tools to assess and improve the cleanliness of a wide variety of fabrication techniques for heterostructures comprising any combination of vdW materials. © 2020 American Chemical Society
URI
https://pr.ibs.re.kr/handle/8788114/7178
ISSN
1944-8244
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > Journal Papers (저널논문)
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