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Oxygen Partial Pressure during Pulsed Laser Deposition: Deterministic Role on Thermodynamic Stability of Atomic Termination Sequence at SrRuO3/BaTiO3 Interface

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Title
Oxygen Partial Pressure during Pulsed Laser Deposition: Deterministic Role on Thermodynamic Stability of Atomic Termination Sequence at SrRuO3/BaTiO3 Interface
Author(s)
Yeong Jae Shin; Lingfei Wang; Yoonkoo Kim; Ho-Hyun Nahm; Daesu Lee; Jeong Rae Kim; Sang Mo Yang; Jong-Gul Yoon; Jin-Seok Chung; Miyoung Kim; Seo Hyoung Chang; Tae Won Noh
Subject
ferroelectric, ; interface engineering, ; oxide heterostructure, ; pulsed laser deposition, ; thermodynamic surface stability
Publication Date
2017-09
Journal
ACS APPLIED MATERIALS & INTERFACES, v.9, no.32, pp.27305 - 27312
Publisher
AMER CHEMICAL SOC
Abstract
With recent trends on miniaturizing oxide-based devices, the need for atomic-scale control of surface/interface structures by pulsed laser deposition (PLD) has increased. In particular, realizing uniform atomic termination at the surface/interface is highly desirable. However, a lack of understanding on the surface formation mechanism in PLD has limited a deliberate control of surface/interface atomic stacking sequences. Here, taking the prototypical SrRuO3/BaTiO3/SrRuO3 (SRO/BTO/SRO) heterostructure as a model system, we investigated the formation of different interfacial termination sequences (BaO-RuO2 or TiO2-SrO) with oxygen partial pressure (PO2) during PLD. We found that a uniform SrO-TiO2 termination sequence at the SRO/BTO interface can be achieved by lowering the PO2 to 5 mTorr, regardless of the total background gas pressure (Ptotal), growth mode, or growth rate. Our results indicate that the thermodynamic stability of the BTO surface at the low-energy kinetics stage of PLD can play an important role in surface/interface termination formation. This work paves the way for realizing termination engineering in functional oxide heterostructures. © 2017 American Chemical Society
URI
https://pr.ibs.re.kr/handle/8788114/3846
DOI
10.1021/acsami.7b07813
ISSN
1944-8244
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > 1. Journal Papers (저널논문)
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