Preparation of WO3 thin film by successive dip coating for electrochromic and photoelectrochromic devices

Abstract

Here we report the superiority of WO<inf>3</inf> thin films prepared by successive dip coating in electrochromic devices. Dip coatings were done on transparent conducting oxide substrates in the WO<inf>3</inf> precursor solution a number of times without drying in between the coating steps. This process enabled the fabrication of WO<inf>3</inf> films with optimum thickness and large roughness, which led to enhanced performance when they were employed as the electrode in electrochromic devices. We made a further observation by applying these electrodes in photoelectrochromic devices and verified the excellent properties of the successively dip-coated WO<inf>3</inf> films. © 2015 Korean Chemical Society & Wiley-VCH Verlag GmbH & Co. KGaA