Simple, green, and clean removal of a poly(methyl methacrylate) film on chemical vapor deposited graphene
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Title
- Simple, green, and clean removal of a poly(methyl methacrylate) film on chemical vapor deposited graphene
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Author(s)
- J-H. Park; Jung, W.; D. Cho; Seo, J-T.; Moon, Y.; Woo, S. H.; Changgu Lee; Park, C-Y.; Joung Real Ahn
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Subject
- Chemical treatments, ; Chemical vapor deposited, ; Four-point probe measurements, ; Heat-treatment process, ; Poly(methyl methacrylate) (PMMA), ; Polymethyl methacrylate films, ; Specific substrates, ; Synchrotron radiation x-rays, ; Esters, ; Geometrical optics, ; Measurements, ; Photoelectron spectroscopy, ; Vapors, ; Graphene
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Publication Date
- 2013-10
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Journal
- APPLIED PHYSICS LETTERS, v.103, no.17, pp.171609
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Publisher
- AMER INST PHYSICS
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Abstract
- The clean removal of a poly(methyl methacrylate) (PMMA) film on graphene has been an essential part of the process of transferring chemical vapor deposited graphene to a specific substrate, influencing the quality of the transferred graphene. Here we demonstrate that the clean removal of PMMA can be achieved by a single heat-treatment process without the chemical treatment that was adopted in other methods of PMMA removal. The cleanness of the transferred graphene was confirmed by four-point probe measurements, synchrotron radiation x-ray photoemission spectroscopy, optical images, and Raman spectroscopy. © 2013 AIP Publishing LLC.
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URI
- https://pr.ibs.re.kr/handle/8788114/1241
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DOI
- 10.1063/1.4824877
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ISSN
- 0003-6951
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Appears in Collections:
- Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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