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Substitutional Vanadium Sulfide Nanodispersed in MoS2 Film for Pt-Scalable Catalyst

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Title
Substitutional Vanadium Sulfide Nanodispersed in MoS2 Film for Pt-Scalable Catalyst
Author(s)
Agyapong-Fordjour, Frederick Osei-Tutu; Seok Joon Yun; Kim, Hyung-Jin; Choi, Wooseon; Kirubasankar, Balakrishnan; Soo Ho Choi; Adofo, Laud Anim; Stephen Boandoh; Kim, Yong In; Kim, Soo Min; Young-Min Kim; Young Hee Lee; Han, Young-Kyu; Ki Kang Kim
Publication Date
2021-08
Journal
Advanced Science, v.8, no.16
Publisher
John Wiley and Sons Inc
Abstract
© 2021 The Authors. Advanced Science published by Wiley-VCH GmbHAmong transition metal dichalcogenides (TMdCs) as alternatives for Pt-based catalysts, metallic-TMdCs catalysts have highly reactive basal-plane but are unstable. Meanwhile, chemically stable semiconducting-TMdCs show limiting catalytic activity due to their inactive basal-plane. Here, metallic vanadium sulfide (VSn) nanodispersed in a semiconducting MoS2 film (V–MoS2) is proposed as an efficient catalyst. During synthesis, vanadium atoms are substituted into hexagonal monolayer MoS2 to form randomly distributed VSn units. The V–MoS2 film on a Cu electrode exhibits Pt-scalable catalytic performance; current density of 1000 mA cm−2 at 0.6 V and overpotential of −0.08 V at a current density of 10 mA cm−2 with excellent cycle stability for hydrogen-evolution-reaction (HER). The high intrinsic HER performance of V–MoS2 is explained by the efficient electron transfer from the Cu electrode to chalcogen vacancies near vanadium sites with optimal Gibbs free energy (−0.02 eV). This study provides insight into ways to engineer TMdCs at the atomic-level to boost intrinsic catalytic activity for hydrogen evolution.
URI
https://pr.ibs.re.kr/handle/8788114/10405
DOI
10.1002/advs.202003709
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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