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Nanodomain Swelling Block Copolymer Lithography for Morphology Tunable Metal Nanopatterning

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Title
Nanodomain Swelling Block Copolymer Lithography for Morphology Tunable Metal Nanopatterning
Author(s)
Jeong Ho Mun; Seung Keun Cha; Kim, Hyowook; Hyoung-Seok Moon; Juyoung Kim; Hyeong Min Jin; Young Joo Choi; Jeong Eun Baek; Jonghwa Shin; Sang Ouk Kim
Subject
block coplymers, metal, nanopatterns, plasmonics
Publication Date
2014-09
Journal
SMALL, v.10, no.18, pp.3742 - 3749
Publisher
WILEY-V C H VERLAG GMBH
Abstract
Ordered metal nanopatterns are crucial requirements for electronics, magnetics, catalysts, photonics, and so on. Despite considerable progress in the synthetic route to metal nanostructures, highly ordered metal nanopatterning over a large-area is still challenging. Nanodomain swelling block copolymer lithography is presented as a general route to the systematic morphology tuning of metal nanopatterns from amphiphilic diblock copolymer self-assembly. Selective swelling of hydrophilic nanocylinder domains in amphiphilic block copolymer fi lms during metal precursor loading and subsequent oxygen based etching generates diverse shapes of metal nanopatterns, including hexagonal nanoring array and hexagonal nanomesh and double line array in addition to common nanodot and nanowire arrays. Solvent annealing condition of block copolymer templates, selective swelling of hydrophilic cylinder nanodomains, block copolymer template thickness, and oxygen based etching methods are the decisive parameters for systematic morphology evolution. The plasmonic properties of ordered Au nanopatterns are characterized and analyzed with fi nite differential time domain calculation. This approach offers unprecedented opportunity for diverse metal nanopatterns from commonly used diblock copolymer self-assembly.
URI
https://pr.ibs.re.kr/handle/8788114/926
DOI
10.1002/smll.201400600
ISSN
1613-6810
Appears in Collections:
Center for Nanomaterials and Chemical Reactions(나노물질 및 화학반응 연구단) > 1. Journal Papers (저널논문)
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