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나노물질 및 화학반응 연구단
나노물질 및 화학반응 연구단
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Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

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Title
Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification
Author(s)
Bong Hoon Kim; Byeon, KJ; Ju Young Kim; Kim, J; Hyeong Min Jin; Cho, JY; Jeong, SJ; Jonghwa Shin; Lee, H; Sang Ouk Kim
Publication Date
2014-10
Journal
SMALL, v.10, no.20, pp.4207 - 4212
Publisher
WILEY-V C H VERLAG GMBH
Abstract
Negative-tone block copolymer (BCP) lithography based on in situ surface chemical modifi cation is introduced as a highly effi cient, versatile self-assembled nanopatterning. BCP blends fi lms consisting of end-functionalized low molecular weight poly(styrene- ran -methyl methacrylate) and polystyrene- block -Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end-functionalized polymers can be covalently bonded during the thermal annealing of BCP thin fi lms. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self-assembled nanodomain formation facilitates single step, site-specifi c BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self-assembly approaches to produce device oriented laterally ordered nanopatterns.
URI
https://pr.ibs.re.kr/handle/8788114/883
ISSN
1613-6810
Appears in Collections:
Center for Nanomaterials and Chemical Reactions(나노물질 및 화학반응 연구단) > Journal Papers (저널논문)
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