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Photoinduced Tuning of Schottky Barrier Height in Graphene/MoS2 Heterojunction for Ultrahigh Performance Short Channel Phototransistor

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dc.contributor.authorIlmin Lee-
dc.contributor.authorWon Tae Kang-
dc.contributor.authorJi Eun Kim-
dc.contributor.authorYoung Rae Kim-
dc.contributor.authorUi Yeon Won-
dc.contributor.authorYoung Hee Lee-
dc.contributor.authorWoo Jong Yu-
dc.date.accessioned2020-12-22T03:00:37Z-
dc.date.accessioned2020-12-22T03:00:37Z-
dc.date.available2020-12-22T03:00:37Z-
dc.date.available2020-12-22T03:00:37Z-
dc.date.created2020-07-22-
dc.date.issued2020-06-
dc.identifier.issn1936-0851-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/7823-
dc.description.abstract© 2020 American Chemical Society Two-dimensional (2D) layered materials with properties such as a large surface-to-volume ratio, strong light interaction, and transparency are expected to be used in future optoelectronic applications. Many studies have focused on ways to increase absorption of 2D-layered materials for use in photodetectors. In this work, we demonstrate another strategy for improving photodetector performance using a graphene/MoS2 heterojunction phototransistor with a short channel length and a tunable Schottky barrier. The channel length of sub-30 nm, shorter than the diffusion length, decreases carrier recombination and carrier transit time in the channel and improves phototransistor performance. Furthermore, our graphene/MoS2 heterojunction phototransistor employed a tunable Schottky barrier that is only controlled by light and gate bias. It maintains a low dark current and an increased photocurrent. As a result, our graphene/MoS2 heterojunction phototransistor showed ultrahigh responsivity and detectivity of 2.2 × 105 A/W and 3.5 × 1013 Jones, respectively. This is a considerable improvement compared to previous pristine MoS2 phototransistors. We confirmed an effective method to develop phototransistors based on 2D materials and obtained ultrahigh performance of our phototransistor, which is promising for high-performance optoelectronic applications-
dc.description.uri1-
dc.language영어-
dc.publisherAMER CHEMICAL SOC-
dc.subjectgraphene-
dc.subjectmolybdenum disulfide-
dc.subjectphototransistor-
dc.subjectSchottky barrier height-
dc.subjectshort channel-
dc.titlePhotoinduced Tuning of Schottky Barrier Height in Graphene/MoS2 Heterojunction for Ultrahigh Performance Short Channel Phototransistor-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000543744100115-
dc.identifier.scopusid2-s2.0-85087094646-
dc.identifier.rimsid72622-
dc.contributor.affiliatedAuthorWon Tae Kang-
dc.contributor.affiliatedAuthorYoung Rae Kim-
dc.contributor.affiliatedAuthorYoung Hee Lee-
dc.identifier.doi10.1021/acsnano.0c03425-
dc.identifier.bibliographicCitationACS NANO, v.14, no.6, pp.7574 - 7580-
dc.citation.titleACS NANO-
dc.citation.volume14-
dc.citation.number6-
dc.citation.startPage7574-
dc.citation.endPage7580-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordAuthorgraphene-
dc.subject.keywordAuthormolybdenum disulfide-
dc.subject.keywordAuthorphototransistor-
dc.subject.keywordAuthorSchottky barrier height-
dc.subject.keywordAuthorshort channel-
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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