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High-mobility junction field-effect transistor via graphene/MoS2 heterointerface

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Title
High-mobility junction field-effect transistor via graphene/MoS2 heterointerface
Author(s)
Taesoo Kim; Sidi Fan; Sanghyub Lee; Min-Kyu Joo; Young Hee Lee
Publication Date
2020-08
Journal
SCIENTIFIC REPORTS, v.10, no.1, pp.13101
Publisher
NATURE PUBLISHING GROUP
Abstract
© 2020, The Author(s).Monolayer molybdenum disulfide (MoS2) possesses a desirable direct bandgap with moderate carrier mobility, whereas graphene (Gr) exhibits a zero bandgap and excellent carrier mobility. Numerous approaches have been suggested for concomitantly realizing high on/off current ratio and high carrier mobility in field-effect transistors, but little is known to date about the effect of two-dimensional layered materials. Herein, we propose a Gr/MoS2 heterojunction platform, i.e., junction field-effect transistor (JFET), that enhances the carrier mobility by a factor of ~ 10 (~ 100 cm2 V−1 s−1) compared to that of monolayer MoS2, while retaining a high on/off current ratio of ~ 108 at room temperature. The Fermi level of Gr can be tuned by the wide back-gate bias (VBG) to modulate the effective Schottky barrier height (SBH) at the Gr/MoS2 heterointerface from 528 meV (n-MoS2/p-Gr) to 116 meV (n-MoS2/n-Gr), consequently enhancing the carrier mobility. The double humps in the transconductance derivative profile clearly reveal the carrier transport mechanism of Gr/MoS2, where the barrier height is controlled by electrostatic doping
URI
https://pr.ibs.re.kr/handle/8788114/7708
DOI
10.1038/s41598-020-70038-6
ISSN
2045-2322
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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