Temperature dependence of velocity saturation in a multilayer molybdenum disulfide transistor
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Byoung Hee Moon | - |
dc.contributor.author | Hyunjin Ji | - |
dc.contributor.author | Jung Jun Bae | - |
dc.contributor.author | Young Hee Lee | - |
dc.date.available | 2020-10-14T08:14:00Z | - |
dc.date.created | 2020-06-29 | - |
dc.date.issued | 2020-03 | - |
dc.identifier.issn | 0268-1242 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/7213 | - |
dc.description.abstract | © 2020 IOP Publishing Ltd Velocity saturation in semiconducting devices is an important parameter that involves in the determination of the upper limit of the operational speed. The large contact resistance in two-dimensional semiconducting nano-devices is troublesome for extracting the saturation velocity from the electrical transport measurements, particularly at low temperatures. We obtain the saturation velocity for multilayer MoS2 from 10 to 300 K using the four-probe method to exclude contact effects. The saturation velocity exhibits strong temperature dependence, with a substantial enhancement at low temperature similar to the mobility, that is, similar to 5.2 x 10(5) cm s(-1) at 300 K and similar to 4.8 x 10(6) cm s(-1) at 10 K. The overall temperature dependence of the saturation velocity can be well represented using an empirical model previously used for Si | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.subject | velocity saturation | - |
dc.subject | multilayer molybdenum disulfide | - |
dc.subject | four-probe measurement | - |
dc.title | Temperature dependence of velocity saturation in a multilayer molybdenum disulfide transistor | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000537720200008 | - |
dc.identifier.scopusid | 2-s2.0-85082644185 | - |
dc.identifier.rimsid | 72575 | - |
dc.contributor.affiliatedAuthor | Byoung Hee Moon | - |
dc.contributor.affiliatedAuthor | Young Hee Lee | - |
dc.identifier.doi | 10.1088/1361-6641/ab714a | - |
dc.identifier.bibliographicCitation | SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.35, no.3, pp.035030 | - |
dc.citation.title | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | - |
dc.citation.volume | 35 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 035030 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | MOS2 TRANSISTORS | - |
dc.subject.keywordPlus | TRANSPORT | - |
dc.subject.keywordAuthor | velocity saturation | - |
dc.subject.keywordAuthor | multilayer molybdenum disulfide | - |
dc.subject.keywordAuthor | four-probe measurement | - |