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Near-field sub-diffraction photolithography with an elastomeric photomask

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Title
Near-field sub-diffraction photolithography with an elastomeric photomask
Author(s)
Sangyoon Paik; Gwangmook Kim; Sehwan Chang; Sooun Lee; Dana Jin; Kwang-Yong Jeong; I Sak Lee; Jekwan Lee; Hongjae Moon; Jaejun Lee; Kiseok Chang; Su Seok Choi; Jeongmin Moon; Soonshin Jung; Shinill Kang; Wooyoung Lee; Heon-Jin Choi; Hyunyong Choi; Hyun Jae Kim; Jae-Hyun Lee; Jinwoo Cheon; Miso Kim; Jaemin Myoung; Hong-Gyu Park; Wooyoung Shim
Publication Date
2020-02
Journal
NATURE COMMUNICATIONS, v.11, no.1, pp.805
Publisher
NATURE PUBLISHING GROUP
Abstract
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions. © The Author(s) 2020
URI
https://pr.ibs.re.kr/handle/8788114/7184
DOI
10.1038/s41467-020-14439-1
ISSN
2041-1723
Appears in Collections:
Center for Nanomedicine (나노의학 연구단) > 1. Journal Papers (저널논문)
Files in This Item:
202002_Near-field sub-diffraction photolithography with an elastomeric photomask.pdfDownload

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