BROWSE

Related Scientist

Researcher

나노의학 연구단
나노의학 연구단
more info

Near-field sub-diffraction photolithography with an elastomeric photomask

Cited 0 time in webofscience Cited 0 time in scopus
71 Viewed 22 Downloaded
Title
Near-field sub-diffraction photolithography with an elastomeric photomask
Author(s)
Sangyoon Paik; Gwangmook Kim; Sehwan Chang; Sooun Lee; Dana Jin; Kwang-Yong Jeong; I Sak Lee; Jekwan Lee; Hongjae Moon; Jaejun Lee; Kiseok Chang; Su Seok Choi; Jeongmin Moon; Soonshin Jung; Shinill Kang; Wooyoung Lee; Heon-Jin Choi; Hyunyong Choi; Hyun Jae Kim; Jae-Hyun Lee; Jinwoo Cheon; Miso Kim; Jaemin Myoung; Hong-Gyu Park; Wooyoung Shim
Publication Date
2020-02
Journal
NATURE COMMUNICATIONS, v.11, no.1, pp.805 -
Publisher
NATURE PUBLISHING GROUP
Abstract
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions. © The Author(s) 2020
URI
https://pr.ibs.re.kr/handle/8788114/7184
ISSN
2041-1723
Appears in Collections:
Center for Nanomedicine (나노의학 연구단) > Journal Papers
Files in This Item:
202002_Near-field sub-diffraction photolithography with an elastomeric photomask.pdfDownload

qrcode

  • facebook

    twitter

  • Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
해당 아이템을 이메일로 공유하기 원하시면 인증을 거치시기 바랍니다.

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Browse