BROWSE

Related Scientist

lee,younghee's photo.

lee,younghee
나노구조물리연구단
more info

ITEM VIEW & DOWNLOAD

Wafer-scale high-quality Ag thin film using a ZnO buffer layer for plasmonic applications

DC Field Value Language
dc.contributor.authorBo-Gwang Jung-
dc.contributor.authorMiyeon Cheon-
dc.contributor.authorSu Jae Kim-
dc.contributor.authorAlexander Gliserin-
dc.contributor.authorSoo Hoon Chew-
dc.contributor.authorChae Ryong Cho-
dc.contributor.authorSeong-Gon Kim-
dc.contributor.authorYoung Hee Lee-
dc.contributor.authorSeungchul Kim-
dc.contributor.authorSe-Young Jeong-
dc.date.available2020-07-06T06:42:06Z-
dc.date.created2020-03-17-
dc.date.issued2020-05-
dc.identifier.issn0169-4332-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/7123-
dc.description.abstract© 2020 Realizing laterally continuous, ultraflat silver (Ag) single-crystal films is a significant technological challenge. Ag thin film grown on various hetero-substrates has been used in numerous applications, due to its superior electrical and optical properties. To exploit these properties without degradation and apply these films to high-precision patterning, surface plasmonics, and so on, a high-quality thin film having an ultraflat surface and few grain boundaries is needed. A zinc oxide (ZnO) buffer layer can be used to facilitate the growth of a single-crystalline Ag thin film on a sapphire (Al2O3) substrate. ZnO films deposited on Al2O3 substrates have grain boundaries; however, Ag films grown on ZnO are nearly grain-free and close to single-crystalline quality. This can be explained by the exceptionally small extended atomic distance mismatch, of ~0.08%, between Ag and Al2O3, in which the ninth Ag atom and the eighth Al atom are matched in terms of coherence and periodicity. A modified radio frequency sputtering system with a single-crystal Ag target enabled wafer-scale growth of ultraflat, grain-free Ag films. The proposed approach using a ZnO buffer provides a new method for fabricating Ag films with high adhesion, anti-oxidative stability, and superior optical properties, and allows for easy nano-patterning-
dc.language영어-
dc.publisherELSEVIER SCIENCE BV-
dc.titleWafer-scale high-quality Ag thin film using a ZnO buffer layer for plasmonic applications-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000522731700077-
dc.identifier.scopusid2-s2.0-85079346655-
dc.identifier.rimsid71420-
dc.contributor.affiliatedAuthorYoung Hee Lee-
dc.identifier.doi10.1016/j.apsusc.2020.145705-
dc.identifier.bibliographicCitationAPPLIED SURFACE SCIENCE, v.512, pp.145705-
dc.relation.isPartOfAPPLIED SURFACE SCIENCE-
dc.citation.titleAPPLIED SURFACE SCIENCE-
dc.citation.volume512-
dc.citation.startPage145705-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordAuthorAg thin film-
dc.subject.keywordAuthorEADM-
dc.subject.keywordAuthorReflectivity-
dc.subject.keywordAuthorSurface plasmon-
dc.subject.keywordAuthorZnO buffer layer-
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
Files in This Item:
Wafer-scale_Applied Surface Science_Young Hee Lee.pdfDownload

qrcode

  • facebook

    twitter

  • Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
해당 아이템을 이메일로 공유하기 원하시면 인증을 거치시기 바랍니다.

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Browse