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다차원 탄소재료 연구단
다차원 탄소재료 연구단
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Ultrafast Catalyst-Free Graphene Growth on Glass Assisted by Local Fluorine Supply

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Title
Ultrafast Catalyst-Free Graphene Growth on Glass Assisted by Local Fluorine Supply
Author(s)
Xie Y.; Ting Cheng; Liu C.; Chen K.; Cheng Y.; Chen Z.; Lu Qiu; Cui G.; Yu Y.; Cui L.; Zhang M.; Zhang J.; Feng Ding; Liu K.; Liu Z.
Publication Date
2019-09
Journal
ACS NANO, v.13, no.9, pp.10272 - 10278
Publisher
AMER CHEMICAL SOC
Abstract
Copyright © 2019 American Chemical Society.High-quality graphene film grown on dielectric substrates by a direct chemical vapor deposition (CVD) method promotes the application of high-performance graphene-based devices in large scale. However, due to the noncatalytic feature of insulating substrates, the production of graphene film on them always has a low growth rate and is time-consuming (typically hours to days), which restricts real potential applications. Here, by employing a local-fluorine-supply method, we have pushed the massive fabrication of a graphene film on a wafer-scale insulating substrate to a short time of just 5 min without involving any metal catalyst. The highly enhanced domain growth rate (∼37 nm min-1) and the quick nucleation rate (∼1200 nuclei min-1 cm-2) both account for this high productivity of graphene film. Further first-principles calculation demonstrates that the released fluorine from the fluoride substrate at high temperature can rapidly react with CH4 to form a more active carbon feedstock, CH3F, and the presence of CH3F molecules in the gas phase much lowers the barrier of carbon attachment, providing sufficient carbon feedstock for graphene CVD growth. Our approach presents a potential route to accomplish exceptionally large-scale and high-quality graphene films on insulating substrates, i.e., SiO2, SiO2/Si, fiber, etc., at low cost for industry-level applications
URI
https://pr.ibs.re.kr/handle/8788114/6436
ISSN
1936-0851
Appears in Collections:
Center for Multidimensional Carbon Materials(다차원 탄소재료 연구단) > Journal Papers (저널논문)
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