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Parameter control for enhanced peak-to-valley current ratio in a MoS2/MoTe2 van der Waals heterostructure

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dc.contributor.authorNgoc Thanh Duong-
dc.contributor.authorSeungho Bang-
dc.contributor.authorSeung Mi Lee-
dc.contributor.authorDang Xuan Dang-
dc.contributor.authorDong Hoon Kuem-
dc.contributor.authorJuchan Lee-
dc.contributor.authorMun Seok Jeong-
dc.contributor.authorSeong Chu Lim-
dc.date.available2019-02-12T10:56:03Z-
dc.date.created2018-08-17-
dc.date.issued2018-07-
dc.identifier.issn2040-3364-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/5548-
dc.description.abstractThe I-ds-V-ds properties of a van der Waals cross-junction of few layered MoS2/MoTe2 were investigated, and the physical device parameters were altered in order to transform the conduction mechanism from thermionic emission to interband tunneling. The pristine heterostructure demonstrated rectification behavior of typical p-n junction diodes, because of the p-type and n-type nature of MoTe2 and MoS2, respectively. Lowering the contact resistance between the metal and channel materials, by changing the electrode metals from Au to Pd and Ti, alone did not give rise to carrier conduction through the hetero-interband tunneling between MoTe2 and MoS2. In addition to the reduction in contact resistance, the chemical doping of MoS2 using Benzyl Viologen (BV) achieves hetero-interband tunneling between MoTe2 and MoS2, which probably narrows the depletion layer by degenerating MoS2. The peak-to-valley ratio of the tunneling current of the BV-doped heterostructure of MoS2/MoTe2 is about 4.8, which is comparable to that of the commercially available Si tunneling diode-
dc.description.uri1-
dc.language영어-
dc.publisherROYAL SOC CHEMISTRY-
dc.titleParameter control for enhanced peak-to-valley current ratio in a MoS2/MoTe2 van der Waals heterostructure-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000438246000011-
dc.identifier.scopusid2-s2.0-85049845952-
dc.identifier.rimsid64373-
dc.contributor.affiliatedAuthorNgoc Thanh Duong-
dc.contributor.affiliatedAuthorSeungho Bang-
dc.contributor.affiliatedAuthorDang Xuan Dang-
dc.contributor.affiliatedAuthorDong Hoon Kuem-
dc.contributor.affiliatedAuthorMun Seok Jeong-
dc.contributor.affiliatedAuthorSeong Chu Lim-
dc.identifier.doi10.1039/c8nr01711e-
dc.identifier.bibliographicCitationNANOSCALE, v.10, no.26, pp.12322 - 12329-
dc.citation.titleNANOSCALE-
dc.citation.volume10-
dc.citation.number26-
dc.citation.startPage12322-
dc.citation.endPage12329-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusNEGATIVE DIFFERENTIAL RESISTANCE-
dc.subject.keywordPlusTRANSITION-METAL DICHALCOGENIDES-
dc.subject.keywordPlusINTERBAND TUNNELING DIODES-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusATOMICALLY THIN MOS2-
dc.subject.keywordPlusFEW-LAYER MOTE2-
dc.subject.keywordPlusCARBON NANOTUBES-
dc.subject.keywordPlusMONOLAYER MOS2-
dc.subject.keywordPlusESAKI DIODES-
dc.subject.keywordPlusTRANSPORT-
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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