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뇌과학 이미징 연구단
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Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography

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Title
Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography
Author(s)
Hyowon Tak; Dongha Tahk; Chanho Jeong; Sori Lee; Tae-il Kim
Publication Date
2017-10
Journal
NANOTECHNOLOGY, v.28, no.40, pp.405301 -
Publisher
IOP PUBLISHING LTD
Abstract
We presented surface energy-tunable nanoscale molds for unconventional lithography. The mold is highly robust, transparent, has a minimized haze, does not contain additives, and is a non-fluorinated isodecyl acrylate and trimethylolpropane triacrylate based polymer. By changing the mixing ratio of the polymer components, the cross-linking density, mechanical modulus, and surface energy (crucial factors in low pressure ((1-2) x 10(5) N m(-2)) low pressure-nanoimprint lithography (LP-NIL)), can be controlled. To verify these properties of the molds, we also characterized the surface energy by measuring the contact angles and calculating the work of adhesion among the wafer, polymer film, and mold for successful demolding in nanoscale structures. Moreover, the molds showed high optical clarity and precisely tunable mechanical and surface properties, capable of replicating sub-100 nm patterns by thermal LP-NIL and UV-NIL. © 2017 IOP Publishing Ltd Printed in the UK
URI
https://pr.ibs.re.kr/handle/8788114/4069
ISSN
0957-4484
Appears in Collections:
Center for Neuroscience Imaging Research (뇌과학 이미징 연구단) > Journal Papers (저널논문)
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