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Rapid Photochemical Synthesis of Sea-Urchin-Shaped Hierarchical Porous COF-5 and Its Lithography-Free Patterned Growth

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Title
Rapid Photochemical Synthesis of Sea-Urchin-Shaped Hierarchical Porous COF-5 and Its Lithography-Free Patterned Growth
Author(s)
Soyoung Kim; Chibeom Park; Minkyung Lee; Intek Song; Jungah Kim; Minhui Lee; Jaehoon Jung; Yousoo Kim; Hyunseob Lim; Hee Cheul Choi
Subject
covalent organic frameworks, ; hierarchical morphology, ; patterned growth, ; photochemical synthesis, ; porous materials
Publication Date
2017-08
Journal
ADVANCED FUNCTIONAL MATERIALS, v.27, no.32, pp.1700925
Publisher
WILEY-V C H VERLAG GMBH
Abstract
Despite potential advantages of covalent organic frameworks (COFs) in wide area applications, several limitations in conventional solvothermal synthesis, such as long reaction time and high reaction temperature, reduce reaction efficiency and prohibit technical processes for practical applications. Therefore, the development of a novel synthesis method that provides better reaction efficiency and spatial controllability has become a critical challenge. Herein, a photochemical synthesis of C9H4BO2 (COF-5) is demonstrated for the first time, by which "sea urchin-shaped" COF-5 (UV-COF-5) with uniform size is synthesized with a highly enhanced growth rate, approximate to 48 times faster than that of the solvothermal method for 75% yield. In addition, an enlarged surface area is measured from UV-COF-5, which originates from its hierarchical morphology. The selectively increased growth rate of UV-COF-5 in the [001] direction observed by microscopic analysis results in the local 1D morphology of the hierarchical structure. Density functional theory calculations determine that the enhanced growth rate along the [001] direction can be understood by the characteristic of the interlayer orbital coupling at the frontier energy region. In addition, this study successfully demonstrates the preparation of COF-5 patterns without any complicated postsynthesis lithography process, but simply by utilizing optical masks during the photochemical method. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
URI
https://pr.ibs.re.kr/handle/8788114/3992
DOI
10.1002/adfm.201700925
ISSN
1616-301X
Appears in Collections:
Center for Artificial Low Dimensional Electronic Systems(원자제어 저차원 전자계 연구단) > 1. Journal Papers (저널논문)
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