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Quantum Conductance Probing of Oxygen Vacancies in SrTiO3 Epitaxial Thin Film using Graphene

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dc.contributor.authorKyeong Tae Kang-
dc.contributor.authorHaeyong Kang-
dc.contributor.authorJeongmin Park-
dc.contributor.authorDongseok Suh-
dc.contributor.authorWoo Seok Choi-
dc.date.available2017-09-05T05:08:45Z-
dc.date.created2017-06-19-
dc.date.issued2017-05-
dc.identifier.issn0935-9648-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/3696-
dc.description.abstractQuantum Hall conductance in monolayer graphene on an epitaxial SrTiO3 (STO) thin film is studied to understand the role of oxygen vacancies in determining the dielectric properties of STO. As the gate-voltage sweep range is gradually increased in the device, systematic generation and annihilation of oxygen vacancies, evidenced from the hysteretic conductance behavior in the graphene, are observed. Furthermore, based on the experimentally observed linear scaling relation between the effective capacitance and the voltage sweep range, a simple model is constructed to manifest the relationship among the dielectric properties of STO with oxygen vacancies. The inherent quantum Hall conductance in graphene can be considered as a sensitive, robust, and noninvasive probe for understanding the electronic and ionic phenomena in complex transition-metal oxides without impairing the oxide layer underneath. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim-
dc.description.uri1-
dc.language영어-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectepitaxial thin films graphene oxygen vacancies quantum Hall conductance SrTiO3-
dc.titleQuantum Conductance Probing of Oxygen Vacancies in SrTiO3 Epitaxial Thin Film using Graphene-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000400636400030-
dc.identifier.scopusid2-s2.0-85015342908-
dc.identifier.rimsid59618ko
dc.date.tcdate2018-10-01-
dc.contributor.affiliatedAuthorKyeong Tae Kang-
dc.contributor.affiliatedAuthorJeongmin Park-
dc.identifier.doi10.1002/adma.201700071-
dc.identifier.bibliographicCitationADVANCED MATERIALS, v.29, no.18, pp.1700071-
dc.citation.titleADVANCED MATERIALS-
dc.citation.volume29-
dc.citation.number18-
dc.citation.startPage1700071-
dc.date.scptcdate2018-10-01-
dc.description.wostc5-
dc.description.scptc3-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusRESISTIVE SWITCHING MEMORIES-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusPHASE-TRANSITIONS-
dc.subject.keywordPlusANODIC-OXIDATION-
dc.subject.keywordPlusTRANSPORT-
dc.subject.keywordPlusHYSTERESIS-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordPlusTITANIUM-
dc.subject.keywordPlusOXIDES-
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
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