Metal-Insulator-Semiconductor Diode Consisting of Two-Dimensional Nanomaterials
DC Field | Value | Language |
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dc.contributor.author | Hyun Jeong | - |
dc.contributor.author | Hye Min Oh | - |
dc.contributor.author | Seungho Bang | - |
dc.contributor.author | Hyeon Jun Jeong | - |
dc.contributor.author | Sung-Jin An | - |
dc.contributor.author | Gang Hee Han | - |
dc.contributor.author | Hyun Kim | - |
dc.contributor.author | Seok Joon Yun | - |
dc.contributor.author | Kim, KK | - |
dc.contributor.author | Jin Cheol Park | - |
dc.contributor.author | Young Hee Lee | - |
dc.contributor.author | Lerondel, G | - |
dc.contributor.author | Mun Seok Jeong | - |
dc.date.available | 2016-06-22T08:13:44Z | - |
dc.date.created | 2016-04-18 | - |
dc.date.issued | 2016-03 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/2544 | - |
dc.description.abstract | We present a novel metal-insulator-semiconductor (MIS) diode consisting of graphene, hexagonal BN, and monolayer MoS2 for application in ultrathin nanoelectronics. The MIS heterojunction structure was fabricated by vertically stacking layered materials using a simple wet chemical transfer method. The stacking of each layer was confirmed by confocal scanning Raman spectroscopy and device performance was evaluated using current versus voltage (I-V) and photocurrent measurements. We clearly observed better current rectification and much higher current flow in the MIS diode than in the p-n junction and the metal-semiconductor diodes made of layered materials. The I-V characteristic curve of the MIS diode indicates that current flows mainly across interfaces as a result of carrier tunneling. Moreover, we observed considerably high photocurrent from the MIS diode under visible light illumination. © 2016 American Chemical Society | - |
dc.language | 영어 | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | carrier tunneling | - |
dc.subject | Graphene | - |
dc.subject | h-BN | - |
dc.subject | metal-insulator-semiconductor diode | - |
dc.subject | monolayer MoS2 | - |
dc.title | Metal-Insulator-Semiconductor Diode Consisting of Two-Dimensional Nanomaterials | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000371946300050 | - |
dc.identifier.scopusid | 2-s2.0-84960539154 | - |
dc.identifier.rimsid | 55128 | ko |
dc.date.tcdate | 2018-10-01 | - |
dc.contributor.affiliatedAuthor | Hyun Jeong | - |
dc.contributor.affiliatedAuthor | Hye Min Oh | - |
dc.contributor.affiliatedAuthor | Seungho Bang | - |
dc.contributor.affiliatedAuthor | Hyeon Jun Jeong | - |
dc.contributor.affiliatedAuthor | Sung-Jin An | - |
dc.contributor.affiliatedAuthor | Gang Hee Han | - |
dc.contributor.affiliatedAuthor | Hyun Kim | - |
dc.contributor.affiliatedAuthor | Seok Joon Yun | - |
dc.contributor.affiliatedAuthor | Jin Cheol Park | - |
dc.contributor.affiliatedAuthor | Young Hee Lee | - |
dc.contributor.affiliatedAuthor | Mun Seok Jeong | - |
dc.identifier.doi | 10.1021/acs.nanolett.5b04936 | - |
dc.identifier.bibliographicCitation | NANO LETTERS, v.16, no.3, pp.1858 - 1862 | - |
dc.relation.isPartOf | NANO LETTERS | - |
dc.citation.title | NANO LETTERS | - |
dc.citation.volume | 16 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 1858 | - |
dc.citation.endPage | 1862 | - |
dc.date.scptcdate | 2018-10-01 | - |
dc.description.wostc | 25 | - |
dc.description.scptc | 22 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | HEXAGONAL BORON-NITRIDE | - |
dc.subject.keywordPlus | FIELD-EFFECT TRANSISTORS | - |
dc.subject.keywordPlus | LARGE-AREA SYNTHESIS | - |
dc.subject.keywordPlus | P-N-JUNCTIONS | - |
dc.subject.keywordPlus | MOLYBDENUM-DISULFIDE | - |
dc.subject.keywordPlus | PHOTOCURRENT GENERATION | - |
dc.subject.keywordPlus | LAYERED SEMICONDUCTOR | - |
dc.subject.keywordPlus | MEMORY DEVICES | - |
dc.subject.keywordPlus | MONOLAYER MOS2 | - |
dc.subject.keywordPlus | GRAPHENE | - |
dc.subject.keywordAuthor | Graphene | - |
dc.subject.keywordAuthor | h-BN | - |
dc.subject.keywordAuthor | monolayer MoS2 | - |
dc.subject.keywordAuthor | metal-insulator-semiconductor diode | - |
dc.subject.keywordAuthor | carrier tunneling | - |