Atomic structure and growth mechanism of T1 precipitate in Al-Cu-Li-Mg-Ag alloy

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Title
Atomic structure and growth mechanism of T1 precipitate in Al-Cu-Li-Mg-Ag alloy
Author(s)
Sung Jin Kang; Kim T.-H.; Yang C.-W.; Lee J.I.; Park E.S.; Taewon Noh; Kim M.
Publication Date
2015-12
Journal
SCRIPTA MATERIALIA, v.109, no., pp.68 - 71
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Abstract
The atomic structure of a 0.94-nm-thick T1 precipitate in an Al-Cu-Li-Mg-Ag alloy is investigated by combining aberration-corrected scanning transmission electron microscopy (STEM) and energy-dispersive X-ray spectroscopy (EDX). Ag segregates at the first layer of the T1 precipitate interface, revealing a significant compositional variation of Ag throughout the interface. Moreover, the T1 precipitate thickened from 0.94 nm with successive stacking of identical 0.94 nm thick layers. © 2015 Acta Materialia Inc
URI
https://pr.ibs.re.kr/handle/8788114/1830
ISSN
1359-6462
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > Journal Papers (저널논문)
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