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나노물질 및 화학반응 연구단
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Directed self-assembly of block copolymers for universal nanopatterning

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Title
Directed self-assembly of block copolymers for universal nanopatterning
Author(s)
Bong Hoon Kim; Ju Young Kim; Sang Ouk Kim
Publication Date
2013-03
Journal
SOFT MATTER, v.9, no.10, pp.2780 - 2786
Publisher
ROYAL SOC CHEMISTRY
Abstract
Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigated for several decades. Recently, directed self-assembly (DSA) of BCPs has received enormous research attention from both academia and industry as next-generation nanolithography technology. This article provides a brief introduction to (i) the spontaneous and directed self-assembly of BCPs, (ii) the orientation and lateral ordering of BCP nanopatterns and their relationships with DSA strategies, (iii) various potential applications of BCP nanopatterning, and (iv) mussel-inspired BCP nanopatterning for arbitrary substrate materials including low surface energy materials.
URI
https://pr.ibs.re.kr/handle/8788114/1362
ISSN
1744-683X
Appears in Collections:
Center for Nanomaterials and Chemical Reactions(나노물질 및 화학반응 연구단) > Journal Papers (저널논문)
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