BROWSE

Related Scientist

cinap's photo.

cinap
나노구조물리연구단
more info

ITEM VIEW & DOWNLOAD

Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors

DC Field Value Language
dc.contributor.authorPark, Heekyeong-
dc.contributor.authorLee, Jiyoul-
dc.contributor.authorHan, Gyuchull-
dc.contributor.authorAlMutairi, AbdulAziz-
dc.contributor.authorKim, Young-Hoon-
dc.contributor.authorLee, Jaichan-
dc.contributor.authorYoung-Min Kim-
dc.contributor.authorKim, Young Jun-
dc.contributor.authorYoon, Youngki-
dc.contributor.authorKim, Sunkook-
dc.date.accessioned2022-07-29T08:11:03Z-
dc.date.available2022-07-29T08:11:03Z-
dc.date.created2022-03-29-
dc.date.issued2021-09-
dc.identifier.issn2662-4443-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/12088-
dc.description.abstract© 2022 Springer Nature Limited. Indirect bandgap of multilayer molybdenum disulfide has been recognized as a major hindrance to high responsivity of MoS2 phototransistors. Here, to overcome this fundamental limitation, we propose a structural engineering of MoS2 via nano-patterning using block copolymer lithography. The fabricated nanoporous MoS2, consisting of periodic hexagonal arrays of hexagon nanoholes, includes abundant edges having a zigzag configuration of atomic columns with molybdenum and sulfur atoms. These exposed zigzag edges are responsible for multiple trap states in the bandgap region, as confirmed by photo-excited charge-collection spectroscopy measurements on multilayer nanoporous MoS2 phototransistors, showing that in-gap states only near the valence band can result in a photogating effect. The effect of nano-patterning is therefore to significantly enhance the responsivity of multilayer nanoporous MoS2 phototransistors, exhibiting an ultra-high photoresponsivity of 622.2 A W−1. Our nano-patterning of MoS2 for photosensing application paves a route to structural engineering of two-dimensional materials for highly sensitive and responsive optoelectronic devices.-
dc.language영어-
dc.publisherSpringer Nature-
dc.titleNano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.scopusid2-s2.0-85125821297-
dc.identifier.rimsid77959-
dc.contributor.affiliatedAuthorYoung-Min Kim-
dc.identifier.doi10.1038/s43246-021-00197-0-
dc.identifier.bibliographicCitationCommunications Materials, v.2, no.1-
dc.relation.isPartOfCommunications Materials-
dc.citation.titleCommunications Materials-
dc.citation.volume2-
dc.citation.number1-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscopus-
Appears in Collections:
Center for Integrated Nanostructure Physics(나노구조물리 연구단) > 1. Journal Papers (저널논문)
Files in This Item:
There are no files associated with this item.

qrcode

  • facebook

    twitter

  • Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
해당 아이템을 이메일로 공유하기 원하시면 인증을 거치시기 바랍니다.

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Browse