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강상관계물질연구단
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Capping and gate control of anomalous Hall effect and hump structure in ultra-thin SrRuO3 films

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dc.contributor.authorDonghan Kim-
dc.contributor.authorByungmin Sohn-
dc.contributor.authorMinsoo Kim-
dc.contributor.authorSungsoo Hahn-
dc.contributor.authorYoungdo Kim-
dc.contributor.authorJong Hyuk Kim-
dc.contributor.authorYoung Jai Choi-
dc.contributor.authorChangyoung Kim-
dc.date.accessioned2021-06-01T00:50:06Z-
dc.date.accessioned2021-06-01T00:50:06Z-
dc.date.available2021-06-01T00:50:06Z-
dc.date.available2021-06-01T00:50:06Z-
dc.date.created2021-05-27-
dc.date.issued2021-04-26-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/9723-
dc.description.abstract© 2021 Author(s).Ferromagnetism and exotic topological structures in SrRuO3 (SRO) induce sign-changing anomalous Hall effect (AHE). Recently, hump structures have been reported in the Hall resistivity of SRO thin films, especially in the ultra-thin regime. We investigate the AHE and hump structure in the Hall resistivity of SRO ultra-thin films with an SrTiO3 (STO) capping layer and ionic liquid gating. STO capping results in sign changes in the AHE and modulation of the hump structure. In particular, the hump structure in the Hall resistivity is strongly modulated and even vanishes in STO-capped 4 unit cell films. In addition, the conductivity of STO-capped SRO ultra-thin films is greatly enhanced with restored ferromagnetism. We also performed ionic liquid gating to modulate the electric field at SRO/STO interface. Drastic changes in the AHE and hump structure are observed with different gate voltages. Our study shows that the hump structure as well as the AHE can be controlled by tuning inversion symmetry and the electric field at the interface.-
dc.language영어-
dc.publisherAmerican Institute of Physics Inc.-
dc.titleCapping and gate control of anomalous Hall effect and hump structure in ultra-thin SrRuO3 films-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000677695200001-
dc.identifier.scopusid2-s2.0-85104997838-
dc.identifier.rimsid75659-
dc.contributor.affiliatedAuthorDonghan Kim-
dc.contributor.affiliatedAuthorByungmin Sohn-
dc.contributor.affiliatedAuthorMinsoo Kim-
dc.contributor.affiliatedAuthorSungsoo Hahn-
dc.contributor.affiliatedAuthorYoungdo Kim-
dc.contributor.affiliatedAuthorChangyoung Kim-
dc.identifier.doi10.1063/5.0050163-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.118, no.17-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume118-
dc.citation.number17-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > 1. Journal Papers (저널논문)
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