Fabrication and Imaging of Monolayer Phosphorene with Preferred Edge Configurations via Graphene-Assisted Layer-by-Layer Thinning
DC Field | Value | Language |
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dc.contributor.author | Yangjin Lee | - |
dc.contributor.author | Sol Lee | - |
dc.contributor.author | Jun-Yeong Yoon | - |
dc.contributor.author | Jinwoo Cheon | - |
dc.contributor.author | Hu Young Jeong | - |
dc.contributor.author | Kwanpyo Kim | - |
dc.date.available | 2020-03-18T08:17:40Z | - |
dc.date.created | 2020-01-07 | - |
dc.date.issued | 2020-01 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/7019 | - |
dc.description.abstract | © 2019 American Chemical Society.Phosphorene, a monolayer of black phosphorus (BP), is an elemental two-dimensional material with interesting physical properties, such as high charge carrier mobility and exotic anisotropic in-plane properties. To fundamentally understand these various physical properties, it is critically important to conduct an atomic-scale structural investigation of phosphorene, particularly regarding various defects and preferred edge configurations. However, it has been challenging to investigate mono- and few-layer phosphorene because of technical difficulties arising in the preparation of a high-quality sample and damages induced during the characterization process. Here, we successfully fabricate high-quality monolayer phosphorene using a controlled thinning process with transmission electron microscopy and subsequently perform atomic-resolution imaging. Graphene protection suppresses the e-beam-induced damage to multilayer BP and one-side graphene protection facilitates the layer-by-layer thinning of the samples, rendering high-quality monolayer and bilayer regions. We also observe the formation of atomic-scale crystalline edges predominantly aligned along the zigzag and (101) terminations, which is originated from edge kinetics under e-beam-induced sputtering process. Our study demonstrates a new method to image and precisely manipulate the thickness and edge configurations of air-sensitive two-dimensional materials | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | aberration-corrected TEM imaging | - |
dc.subject | crystalline edge structure | - |
dc.subject | graphene protection | - |
dc.subject | Phosphorene | - |
dc.title | Fabrication and Imaging of Monolayer Phosphorene with Preferred Edge Configurations via Graphene-Assisted Layer-by-Layer Thinning | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000507151600072 | - |
dc.identifier.scopusid | 2-s2.0-85076247998 | - |
dc.identifier.rimsid | 70907 | - |
dc.contributor.affiliatedAuthor | Yangjin Lee | - |
dc.contributor.affiliatedAuthor | Sol Lee | - |
dc.contributor.affiliatedAuthor | Jun-Yeong Yoon | - |
dc.contributor.affiliatedAuthor | Jinwoo Cheon | - |
dc.contributor.affiliatedAuthor | Kwanpyo Kim | - |
dc.identifier.doi | 10.1021/acs.nanolett.9b04292 | - |
dc.identifier.bibliographicCitation | NANO LETTERS, v.20, no.1, pp.559 - 566 | - |
dc.citation.title | NANO LETTERS | - |
dc.citation.volume | 20 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 559 | - |
dc.citation.endPage | 566 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | BLACK PHOSPHORUS | - |
dc.subject.keywordPlus | RADIATION-DAMAGE | - |
dc.subject.keywordPlus | SEMICONDUCTOR | - |
dc.subject.keywordPlus | VACANCIES | - |
dc.subject.keywordPlus | STRAIN | - |
dc.subject.keywordAuthor | Phosphorene | - |
dc.subject.keywordAuthor | aberration-corrected TEM imaging | - |
dc.subject.keywordAuthor | crystalline edge structure | - |
dc.subject.keywordAuthor | graphene protection | - |