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나노물질및화학반응연구단
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Direct Observation of a Transiently Formed Isomer during Iodoform Photolysis in Solution by Time-Resolved X-ray Liquidography

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dc.contributor.authorChi Woo Ahn-
dc.contributor.authorHosung Ki-
dc.contributor.authorJoonghan Kim-
dc.contributor.authorJeongho Kim-
dc.contributor.authorSungjun Park-
dc.contributor.authorYunbeom Lee-
dc.contributor.authorKyung Hwan Kim-
dc.contributor.authorQingyu Kong-
dc.contributor.authorJiwon Moon-
dc.contributor.authorMartin Nors Pedersen-
dc.contributor.authorMichael Wulff-
dc.contributor.authorHyotcherl Ihee-
dc.date.available2018-07-18T02:05:40Z-
dc.date.created2018-04-16-
dc.date.issued2018-02-
dc.identifier.issn1948-7185-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/4660-
dc.description.abstractPhotolysis of iodoform (CHI3) in solution has been extensively studied, but its reaction mechanism remains elusive. In particular, iso-iodoform (iso-CHI2-I) is formed as a product of the photolysis reaction, but its detailed structure is not known, and whether it is a major intermediate species has been controversial. Here, by using time-resolved X-ray liquidography, we determined the reaction mechanism of CHI3 photodissociation in cyclohexane as well as the structure of iso-CHI2-I. Both iso-CHI2-I and CHI2 radical were found to be formed within 100 ps with a branching ratio of 40:60. Iodine radicals (I), formed during the course of CHI3 photolysis, recombine nongeminately with either CHI2 or I. Based on our structural analysis, the I-I distance and the C-I-I angle of iso-CHI2-I were determined to be 2.922 ± 0.004 Å and 133.9 ± 0.8°, respectively. © 2018 American Chemical Society-
dc.description.uri1-
dc.language영어-
dc.publisherAMER CHEMICAL SOC-
dc.titleDirect Observation of a Transiently Formed Isomer during Iodoform Photolysis in Solution by Time-Resolved X-ray Liquidography-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000424315900032-
dc.identifier.scopusid2-s2.0-85041445685-
dc.identifier.rimsid63095ko
dc.contributor.affiliatedAuthorChi Woo Ahn-
dc.contributor.affiliatedAuthorHosung Ki-
dc.contributor.affiliatedAuthorSungjun Park-
dc.contributor.affiliatedAuthorYunbeom Lee-
dc.contributor.affiliatedAuthorKyung Hwan Kim-
dc.contributor.affiliatedAuthorHyotcherl Ihee-
dc.identifier.doi10.1021/acs.jpclett.7b03125-
dc.identifier.bibliographicCitationJOURNAL OF PHYSICAL CHEMISTRY LETTERS, v.9, no.3, pp.647 - 653-
dc.citation.titleJOURNAL OF PHYSICAL CHEMISTRY LETTERS-
dc.citation.volume9-
dc.citation.number3-
dc.citation.startPage647-
dc.citation.endPage653-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
Appears in Collections:
Center for Nanomaterials and Chemical Reactions(나노물질 및 화학반응 연구단) > 1. Journal Papers (저널논문)
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