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Carrier-Type Modulation and Mobility Improvement of Thin MoTe2

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dc.contributor.authorDeshun Qu-
dc.contributor.authorXiaochi Liu-
dc.contributor.authorMing Huang-
dc.contributor.authorChangmin Lee-
dc.contributor.authorFaisal Ahmed-
dc.contributor.authorHyoungsub Kim-
dc.contributor.authorRodney S. Ruoff-
dc.contributor.authorJames Hone-
dc.contributor.authorWon Jong Yoo-
dc.date.available2018-01-11T04:25:00Z-
dc.date.created2017-11-17-
dc.date.issued2017-10-
dc.identifier.issn0935-9648-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/4266-
dc.description.abstractA systematic modulation of the carrier type in molybdenum ditelluride (MoTe2) field-effect transistors (FETs) is described, through rapid thermal annealing (RTA) under a controlled O-2 environment (p-type modulation) and benzyl viologen (BV) doping (n-type modulation). Al2O3 capping is then introduced to improve the carrier mobilities and device stability. MoTe2 is found to be ultrasensitive to O-2 at elevated temperatures (250 degrees C). Charge carriers of MoTe2 flakes annealed via RTA at various vacuum levels are tuned between predominantly pristine n-type ambipolar, symmetric ambipolar, unipolar p-type, and degenerate-like p-type. Changes in the MoTe2-transistor performance are confirmed to originate from the physical and chemical absorption and dissociation of O-2, especially at tellurium vacancy sites. The electron branch is modulated by varying the BV dopant concentrations and annealing conditions. Unipolar n-type MoTe2 FETs with a high on-off ratio exceeding 10(6) are achieved under optimized doping conditions. By introducing Al2O3 capping, carrier field effect mobilities (41 for holes and 80 cm(2) V-1 s(-1) for electrons) and device stability are improved due to the reduced trap densities and isolation from ambient air. Lateral MoTe2 p-n diodes with an ideality factor of 1.2 are fabricated using the p- and n-type doping technique to test the superb potential of the doping method in functional electronic device applications. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim-
dc.description.uri1-
dc.language영어-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectcontrollable doping-
dc.subjectmobility improvement-
dc.subjectMoTe2-
dc.subjectunipolar transistors-
dc.titleCarrier-Type Modulation and Mobility Improvement of Thin MoTe2-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000412925600024-
dc.identifier.scopusid2-s2.0-85028317165-
dc.identifier.rimsid60828ko
dc.date.tcdate2018-10-01-
dc.contributor.affiliatedAuthorMing Huang-
dc.contributor.affiliatedAuthorRodney S. Ruoff-
dc.identifier.doi10.1002/adma.201606433-
dc.identifier.bibliographicCitationADVANCED MATERIALS, v.29, no.39, pp.1606433-
dc.citation.titleADVANCED MATERIALS-
dc.citation.volume29-
dc.citation.number39-
dc.citation.startPage1606433-
dc.date.scptcdate2018-10-01-
dc.description.wostc5-
dc.description.scptc6-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusBLACK PHOSPHORUS TRANSISTORS-
dc.subject.keywordPlusMULTILAYER MOS2 TRANSISTOR-
dc.subject.keywordPlusMETAL-INSULATOR-TRANSITION-
dc.subject.keywordPlusLAYER-DEPOSITED AL2O3-
dc.subject.keywordPlusBAND-GAP-
dc.subject.keywordPlusMOLYBDENUM-DISULFIDE-
dc.subject.keywordPlusMONOLAYER MOS2-
dc.subject.keywordPlusALPHA-MOTE2-
dc.subject.keywordPlusDIELECTRICS-
dc.subject.keywordAuthorcontrollable doping-
dc.subject.keywordAuthormobility improvement-
dc.subject.keywordAuthorMoTe2-
dc.subject.keywordAuthorunipolar transistors-
Appears in Collections:
Center for Multidimensional Carbon Materials(다차원 탄소재료 연구단) > 1. Journal Papers (저널논문)
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2. Qu_et_al-2017-Advanced_Materials.pdfDownload

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