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다차원 탄소재료 연구단
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Carbon-assisted chemical vapor deposition of hexagonal boron nitride

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Title
Carbon-assisted chemical vapor deposition of hexagonal boron nitride
Author(s)
Ariel Ismach; Harry Chou; Patrick Mende; Andrei Dolocan; Rafik Addou; Shaul Aloni; Robert Wallace; Randall Feenstra; Rodney S Ruoff; Luigi Colombo
Publication Date
2017-06
Journal
2D Materials, v.4, no.2, pp.025117 -
Publisher
IOP PUBLISHING LTD
Abstract
We show that in a low-pressure chemical vapor deposition (CVD) system, the residual oxygen and/or air play a crucial role in the mechanism of the growth of hexagonal boron nitride (h-BN) films on Ni foil 'enclosures'. Hexagonal-BN films grow on the Ni foil surface via the formation of an intermediate boric-oxide (BOx) phase followed by a thermal reduction of the BOx by a carbon source (either amorphous carbon powder or methane), leading to the formation of single-and bi-layer h-N. Low energy electron microscopy (LEEM) and diffraction (LEED) were used to map the number of layers over large areas; Raman spectroscopy, time-of-flight secondary ion mass spectrometry (ToF-SIMS), x-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM) were used to characterize the structure and physical quality of the ultra-thin h-BN film. The growth procedure reported here leads to a better understanding and control of the synthesis of ultra-thin h-BN films. © 2017 IOP Publishing Ltd
URI
https://pr.ibs.re.kr/handle/8788114/3882
ISSN
2053-1583
Appears in Collections:
Center for Multidimensional Carbon Materials(다차원 탄소재료 연구단) > Journal Papers (저널논문)
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