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Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: Unconventional nanolithography and its applications

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Title
Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: Unconventional nanolithography and its applications
Author(s)
Sori Lee; Byeonghak Park; Jun Sik Kim; Tae-il Kim
Publication Date
2016-11
Journal
NANOTECHNOLOGY, v.27, no.47, pp.474001 -
Publisher
IOP PUBLISHING LTD
Abstract
The patterning of high-resolution-featured deep-nanoscale structures with a high aspect ratio (AR) has received increasing attention in recent years as a promising technique for a wide range of applications, including electrical, optical, mechanical and biological systems. Despite extensive efforts to develop viable nanostructure fabrication processes, a superior technique enabling defect-free, high-resolution control over a large area is still required. In this review, we focus on recent important advances in the designs and processes of high-resolution nanostructures possessing a high AR, including hierarchical and 3D patterns. The unique applications of these materials are also discussed. © 2016 IOP Publishing Ltd
URI
https://pr.ibs.re.kr/handle/8788114/3099
ISSN
0957-4484
Appears in Collections:
Center for Neuroscience Imaging Research (뇌과학 이미징 연구단) > Journal Papers (저널논문)
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