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Recent Advances in Unconventional Lithography for Challenging 3D Hierarchical Structures and Their Applications Highly Cited Paper

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Title
Recent Advances in Unconventional Lithography for Challenging 3D Hierarchical Structures and Their Applications
Author(s)
Jong Uk Kim; Sori Lee; Tae-il Kim
Publication Date
2016-03
Journal
JOURNAL OF NANOMATERIALS, v.2016, no., pp.7602395 -
Publisher
HINDAWI PUBLISHING CORP
Abstract
In nanoscience and nanotechnology, nanofabrication is critical. Among the required processes for nanofabrication, lithography is one of core issues. Although conventional photolithography with recent remarkable improvement has contributed to the industry during the past few decades, fabrication of 3-dimensional (3D) nanostructure is still challenging. In this review, we summarize recent advances for the construction of 3D nanostructures by unconventional lithography and the combination of two top-down approaches or top-down and bottom-up approaches. We believe that the 3D hierarchical nanostructures described here will have a broad range of applications having adaptable levels of functional integration of precisely controlled nanoarchitectures that are required by not only academia, but also industry. © 2016 Jong Uk Kim et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
URI
http://pr.ibs.re.kr/handle/8788114/2546
DOI
10.1155/2016/7602395
ISSN
1687-4110
Appears in Collections:
Center for Neuroscience Imaging Research (뇌과학 이미징 연구단) > Journal Papers (저널논문)
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