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Origin of variation in switching voltages in threshold-switching phenomena of VO2 thin films

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dc.contributor.authorShin Buhm Lee-
dc.contributor.authorKwangwoo Kim-
dc.contributor.authorJi Seop Oh-
dc.contributor.authorByungnam Kahng-
dc.contributor.authorJae Sung Lee-
dc.date.available2015-04-20T07:16:08Z-
dc.date.created2014-08-11-
dc.date.issued2013-02-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/1387-
dc.description.abstractWe investigated the origin of the variation in switching voltages in threshold-switching of VO2 thin films. When a triangular-waveform voltage signal was applied, the current changed abruptly at two switching voltages, i.e., VON (insulator-to-metal) and VOFF (metal-to-insulator). VON and VOFF were measured by changing the period of the voltage signal, the temperature of the environment, and the load resistance. We observed that either VON or V OFF varied significantly and had different dependences with respect to the external parameters. Based on the mechanism of the metal-insulator transition induced by Joule heating, numerical simulations were performed, which quantitatively reproduced all of the experimental results. From the simulation analysis, the variation in the switching voltages for threshold-switching was determined to be thermal in origin. © 2013 American Institute of Physics.-
dc.language영어-
dc.publisherAMER INST PHYSICS-
dc.subjectInsulator to metal-
dc.subjectLoad resistances-
dc.subjectSimulation analysis-
dc.subjectSwitching voltages-
dc.subjectVoltage signals-
dc.subjectSemiconductor insulator boundaries-
dc.subjectThin films-
dc.subjectVoltage measurement-
dc.subjectSwitching-
dc.titleOrigin of variation in switching voltages in threshold-switching phenomena of VO2 thin films-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000315053300094-
dc.identifier.scopusid2-s2.0-84874232531-
dc.identifier.rimsid206ko
dc.date.tcdate2018-10-01-
dc.contributor.affiliatedAuthorShin Buhm Lee-
dc.contributor.affiliatedAuthorJi Seop Oh-
dc.identifier.doi10.1063/1.4790842-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.102, no.6, pp.63501-1 - 63501-5-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume102-
dc.citation.number6-
dc.citation.startPage63501-1-
dc.citation.endPage63501-5-
dc.date.scptcdate2018-10-01-
dc.description.wostc14-
dc.description.scptc15-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusMETAL-INSULATOR-TRANSITION-
dc.subject.keywordPlusMEMORY-
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > 1. Journal Papers (저널논문)
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