Origin of variation in switching voltages in threshold-switching phenomena of VO2 thin films
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin Buhm Lee | - |
dc.contributor.author | Kwangwoo Kim | - |
dc.contributor.author | Ji Seop Oh | - |
dc.contributor.author | Byungnam Kahng | - |
dc.contributor.author | Jae Sung Lee | - |
dc.date.available | 2015-04-20T07:16:08Z | - |
dc.date.created | 2014-08-11 | - |
dc.date.issued | 2013-02 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/1387 | - |
dc.description.abstract | We investigated the origin of the variation in switching voltages in threshold-switching of VO2 thin films. When a triangular-waveform voltage signal was applied, the current changed abruptly at two switching voltages, i.e., VON (insulator-to-metal) and VOFF (metal-to-insulator). VON and VOFF were measured by changing the period of the voltage signal, the temperature of the environment, and the load resistance. We observed that either VON or V OFF varied significantly and had different dependences with respect to the external parameters. Based on the mechanism of the metal-insulator transition induced by Joule heating, numerical simulations were performed, which quantitatively reproduced all of the experimental results. From the simulation analysis, the variation in the switching voltages for threshold-switching was determined to be thermal in origin. © 2013 American Institute of Physics. | - |
dc.language | 영어 | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | Insulator to metal | - |
dc.subject | Load resistances | - |
dc.subject | Simulation analysis | - |
dc.subject | Switching voltages | - |
dc.subject | Voltage signals | - |
dc.subject | Semiconductor insulator boundaries | - |
dc.subject | Thin films | - |
dc.subject | Voltage measurement | - |
dc.subject | Switching | - |
dc.title | Origin of variation in switching voltages in threshold-switching phenomena of VO2 thin films | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000315053300094 | - |
dc.identifier.scopusid | 2-s2.0-84874232531 | - |
dc.identifier.rimsid | 206 | ko |
dc.date.tcdate | 2018-10-01 | - |
dc.contributor.affiliatedAuthor | Shin Buhm Lee | - |
dc.contributor.affiliatedAuthor | Ji Seop Oh | - |
dc.identifier.doi | 10.1063/1.4790842 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.102, no.6, pp.63501-1 - 63501-5 | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 102 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 63501-1 | - |
dc.citation.endPage | 63501-5 | - |
dc.date.scptcdate | 2018-10-01 | - |
dc.description.wostc | 14 | - |
dc.description.scptc | 15 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | METAL-INSULATOR-TRANSITION | - |
dc.subject.keywordPlus | MEMORY | - |