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Engineering structural homogeneity and magnetotransport in strained Nd2Ir2O7 films

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dc.contributor.authorJeongkeun Song-
dc.contributor.authorEun Kyo Ko-
dc.contributor.authorLee, Sangmin-
dc.contributor.authorMun, Junsik-
dc.contributor.authorJi Hwan Jeong-
dc.contributor.authorJong Hwa Lee-
dc.contributor.authorKim, Woo Jin-
dc.contributor.authorKim, Miyoung-
dc.contributor.authorLi, Yangyang-
dc.contributor.authorJi Hye Lee-
dc.contributor.authorTae Won Noh-
dc.date.accessioned2023-06-26T22:00:25Z-
dc.date.available2023-06-26T22:00:25Z-
dc.date.created2023-06-20-
dc.date.issued2023-06-
dc.identifier.issn2166-532X-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/13493-
dc.description.abstractThe 5d pyrochlore iridate family (R2Ir2O7, where R is a rare earth ion) has garnered significant attention due to its topological properties, such as Weyl semimetallic phases and axion insulator. However, the investigation of these properties has been impeded by severe iridium loss during growth, which results in the formation of defects and impurities. Herein, we demonstrate a method for controlling impurities and defects in strained Nd2Ir2O7 (NIO-227) films by compensating for iridium loss during growth. By increasing the amount of IrO2 target ablated, we enhance the morphological quality and electrical transport properties of the fabricated films. Furthermore, our results show that the anomalous Hall effects of the films have a strong dependency on the amount of IrO2 target ablated, which is attributed to the structural inhomogeneity in the NIO-227 films. Our work provides a way to control defects and impurities and would promote the investigation of topological phases in the family R2Ir2O7-
dc.language영어-
dc.publisherAmerican Institute of Physics Inc.-
dc.titleEngineering structural homogeneity and magnetotransport in strained Nd2Ir2O7 films-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid001027505800005-
dc.identifier.scopusid2-s2.0-85161050299-
dc.identifier.rimsid80979-
dc.contributor.affiliatedAuthorJeongkeun Song-
dc.contributor.affiliatedAuthorEun Kyo Ko-
dc.contributor.affiliatedAuthorJi Hwan Jeong-
dc.contributor.affiliatedAuthorJong Hwa Lee-
dc.contributor.affiliatedAuthorJi Hye Lee-
dc.contributor.affiliatedAuthorTae Won Noh-
dc.identifier.doi10.1063/5.0153164-
dc.identifier.bibliographicCitationAPL Materials, v.11, no.6-
dc.relation.isPartOfAPL Materials-
dc.citation.titleAPL Materials-
dc.citation.volume11-
dc.citation.number6-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusTOPOLOGICAL PHASES-
dc.subject.keywordPlusINSULATOR-TRANSITION-
dc.subject.keywordPlusPYROCHLORE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusMETAL-
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > 1. Journal Papers (저널논문)
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