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Multi-stage anisotropic etching of two-dimensional heterostructures (Apr, 10.1007/s12274-022-4193-x, 2022)

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Title
Multi-stage anisotropic etching of two-dimensional heterostructures (Apr, 10.1007/s12274-022-4193-x, 2022)
Author(s)
Li, Lin; Jichen Dong; Geng, Dechao; Li, Menghan; Fu, Wei; Feng Ding; Hu, Wenping; Yang, Hui Ying
Publication Date
2022-07
Journal
NANO RESEARCH, v.15, no.6, pp.4909 - 4915
Publisher
TSINGHUA UNIV PRESS
Abstract
Regarding the reverse process of materials growth, etching has been widely concerned to indirectly probe the growth kinetics, offering an avenue in governing the growth of two-dimensional (2D) materials. In this work, interface-driven anisotropic etching mode is demonstrated for the first time to be generally applied to 2D heterostructures. It is shown that the typical in-plane graphene and hexagonal boron nitride (h-BN) heterostructures follow a multi-stage etching behavior initiated first along the interfacial region between the two materials and then along edges of neighboring h-BN flakes and finally along central edges of h-BN. By accurately tuning etching conditions in the chemical vapor deposition process, series of etched 2D heterostructure patterns are controllably produced. Furthermore, scaled formation of graphene and h-BN heterostructures arrays has been realized with full assist of as-proposed etching mechanism, offering a direct top-down method to make 2D orientated heterostructures with order and complexity. Detection of interface-driven multi-staged anisotropic etching mode will shed light on understanding growth mechanism and further expanding wide applications of 2D heterostructures.
URI
https://pr.ibs.re.kr/handle/8788114/11961
DOI
10.1007/s12274-022-4387-2
ISSN
1998-0124
Appears in Collections:
Center for Multidimensional Carbon Materials(다차원 탄소재료 연구단) > 1. Journal Papers (저널논문)
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