Polarization modulation effect of BeO on AlGaN/GaN high-electron-mobility transistors
DC Field | Value | Language |
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dc.contributor.author | Wang W. | - |
dc.contributor.author | Lee S.M. | - |
dc.contributor.author | Pouladi S. | - |
dc.contributor.author | Chen J. | - |
dc.contributor.author | Shervin S. | - |
dc.contributor.author | Yoon S. | - |
dc.contributor.author | Jung Hwan Yum | - |
dc.contributor.author | Eric S. Larsen | - |
dc.contributor.author | Christopher W. Bielawski | - |
dc.contributor.author | Chatterjee B. | - |
dc.contributor.author | Choi S. | - |
dc.contributor.author | Oh J. | - |
dc.contributor.author | Ryou J.-H. | - |
dc.date.available | 2019-11-13T07:32:27Z | - |
dc.date.created | 2019-10-21 | - |
dc.date.issued | 2019-09 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/6428 | - |
dc.description.abstract | © 2019 Author(s).We investigate the polarization modulation effect of a single-crystalline BeO layer on AlGaN/GaN high-electron-mobility transistors (HEMTs). The BeO layer with macroscopic polarization on top of the AlGaN barrier layer increases the 2-dimensional electron gas density in the triangular quantum well (QW) at the interface of the AlGaN/GaN heterostructure. Electronic band bending of BeO and a deeper triangular QW observed from the simulated conduction band profile indicate that the BeO layer can modify the polarization field at the AlGaN/GaN interface. A ∼20-nm-thick single-crystalline BeO thin film is grown on AlGaN/GaN HEMTs by atomic-layer deposition. Room-temperature and variable-temperature Hall-effect measurements confirm that the HEMT with BeO forms a channel with a 14% increase of the sheet carrier concentration as compared with a conventional HEMT. An improved output performance is also observed in the I-V characteristics which confirms the polarization modulation effect of the BeO layer | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Polarization modulation effect of BeO on AlGaN/GaN high-electron-mobility transistors | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000484671000005 | - |
dc.identifier.scopusid | 2-s2.0-85072201249 | - |
dc.identifier.rimsid | 69855 | - |
dc.contributor.affiliatedAuthor | Jung Hwan Yum | - |
dc.contributor.affiliatedAuthor | Eric S. Larsen | - |
dc.contributor.affiliatedAuthor | Christopher W. Bielawski | - |
dc.identifier.doi | 10.1063/1.5108832 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.115, no.10, pp.103502 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 115 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 103502 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |