Development of a plasma shutter applicable to 100-mJ-class, 10-ns laser pulses and the characterization of its performance
DC Field | Value | Language |
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dc.contributor.author | JE HOI MUN | - |
dc.contributor.author | Sakai, H | - |
dc.contributor.author | Minemoto, S | - |
dc.date.available | 2019-09-25T07:24:21Z | - |
dc.date.created | 2019-08-20 | - |
dc.date.issued | 2019-07 | - |
dc.identifier.issn | 0146-9592 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/6128 | - |
dc.description.abstract | © 2019 Optical Society of America.For the purpose of preparing a sample of aligned and oriented molecules in the laser-field-free condition, we developed a plasma shutter, which enables laser pulses with 100-mJ-class, 10-ns pulse durations to be rapidly turned off within ∼150 fs. In this work, the residual field intensity after the rapid turn off is carefully examined by applying the shaped laser pulse to OCS molecules in the rotational ground state. Based on the comparison between the observation of alignment revivals of the OCS molecules and the results of numerical simulations, we demonstrate that the residual field intensity is actually negligible (below 0.4% of the peak intensity) and, if any, does not influence the alignment and orientation dynamics at all | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | OPTICAL SOC AMER | - |
dc.title | Development of a plasma shutter applicable to 100-mJ-class, 10-ns laser pulses and the characterization of its performance | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000474429600004 | - |
dc.identifier.scopusid | 2-s2.0-85068567741 | - |
dc.identifier.rimsid | 69129 | - |
dc.contributor.affiliatedAuthor | JE HOI MUN | - |
dc.identifier.doi | 10.1364/OE.27.019130 | - |
dc.identifier.bibliographicCitation | OPTICS LETTERS, v.27, no.14, pp.19130 - 19140 | - |
dc.citation.title | OPTICS LETTERS | - |
dc.citation.volume | 27 | - |
dc.citation.number | 14 | - |
dc.citation.startPage | 19130 | - |
dc.citation.endPage | 19140 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | MOLECULES | - |
dc.subject.keywordPlus | ALIGNMENT | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | BEAM | - |