Formation Mechanism, Growth Kinetics, and Stability Limits of Graphene Adlayers in Metal-Catalyzed CVD Growth
DC Field | Value | Language |
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dc.contributor.author | Zhu-Jun Wang | - |
dc.contributor.author | Feng Ding | - |
dc.contributor.author | Gyula Eres | - |
dc.contributor.author | Markus Antonietti | - |
dc.contributor.author | Robert Schloegl | - |
dc.contributor.author | Marc Georg Willinger | - |
dc.date.available | 2019-02-12T10:54:57Z | - |
dc.date.created | 2018-08-17 | - |
dc.date.issued | 2018-07 | - |
dc.identifier.issn | 2196-7350 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/5544 | - |
dc.description.abstract | A new mechanism by which catalytic chemical vapor deposition of graphene spontaneously terminates at a single layer on Pt foils is discussed. This self-limited growth regime is identified by direct imaging of adlayer graphene evolution using in-situ environmental scanning electron microscopy. Two fundamentally different mechanisms for adlayer nucleation are revealed. Besides primary nucleation, which is the standard nucleation that occurs only at the onset of growth, a secondary nucleation of adlayers is observed near full coverage of the substrate. Direct observation reveals layer-dependent growth kinetics and the establishment of a dynamic equilibrium between the forward reaction of carbon incorporation and the reverse reaction of graphene etching. Increasing coverage of the active catalyst gives rise to a spontaneous reversal of adlayer evolution from growth to etching. The growth reversal has important practical benefits. It creates a self-limited growth regime in which all adlayer graphene is removed and it enables large-scale production of 100% single-layer graphene © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | WILEY | - |
dc.subject | adlayer nucleation | - |
dc.subject | catalytic chemical vapor deposition | - |
dc.subject | graphene growth | - |
dc.subject | in-situ | - |
dc.subject | self-limited growth | - |
dc.title | Formation Mechanism, Growth Kinetics, and Stability Limits of Graphene Adlayers in Metal-Catalyzed CVD Growth | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000439739000008 | - |
dc.identifier.scopusid | 2-s2.0-85047398804 | - |
dc.identifier.rimsid | 64366 | - |
dc.contributor.affiliatedAuthor | Feng Ding | - |
dc.identifier.doi | 10.1002/admi.201800255 | - |
dc.identifier.bibliographicCitation | ADVANCED MATERIALS INTERFACES, v.5, no.14, pp.1800255 | - |
dc.citation.title | ADVANCED MATERIALS INTERFACES | - |
dc.citation.volume | 5 | - |
dc.citation.number | 14 | - |
dc.citation.startPage | 1800255 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | SINGLE-CRYSTAL GRAPHENE | - |
dc.subject.keywordPlus | SCANNING-TUNNELING-MICROSCOPY | - |
dc.subject.keywordPlus | EPITAXIAL GRAPHENE | - |
dc.subject.keywordPlus | CARBON | - |
dc.subject.keywordPlus | COPPER | - |
dc.subject.keywordPlus | CU | - |
dc.subject.keywordPlus | DYNAMICS | - |
dc.subject.keywordPlus | SOLUBILITY | - |
dc.subject.keywordPlus | RUTHENIUM | - |
dc.subject.keywordAuthor | adlayer nucleation | - |
dc.subject.keywordAuthor | catalytic chemical vapor deposition | - |
dc.subject.keywordAuthor | graphene growth | - |
dc.subject.keywordAuthor | in-situ | - |
dc.subject.keywordAuthor | self-limited growth | - |