Intensity-dependent resonant transmission of x-rays in solid-density aluminum plasma
DC Field | Value | Language |
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dc.contributor.author | M. S. Cho | - |
dc.contributor.author | Chung H.-K. | - |
dc.contributor.author | B. I. Cho | - |
dc.date.available | 2018-12-13T10:46:26Z | - |
dc.date.created | 2018-06-26 | - |
dc.date.issued | 2018-05 | - |
dc.identifier.issn | 1070-664X | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/4990 | - |
dc.description.abstract | X-ray free-electron lasers (XFELs) provide unique opportunities to generate and investigate dense plasmas. The absorption and transmission properties of x-ray photons in dense plasmas are important in characterizing the state of the plasmas. Experimental evidence shows that the transmission of x-ray photons through dense plasmas depends greatly on the incident XFEL intensity. Here, we present a detailed analysis of intensity-dependent x-ray transmission in solid-density aluminum using collisional-radiative population kinetics calculations. Reverse saturable absorption (RSA), i.e., an increase in x-ray absorption with intensity has been observed for photon energies below the K-absorption edge and in the intensity range of 1016-1017 W/cm2 for XFEL photons with 1487 eV. At higher intensities, a transition from RSA to saturable absorption (SA) is predicted; thus, the x-ray absorption decreases with intensity above a threshold value. For XFEL photon energies of 1501 eV and 1515 eV, the transition from RSA to SA occurs at XFEL intensities between 1017-1018 W/cm2. Electron temperatures are predicted to be in the range of 30-50 eV for the given experimental conditions. Detailed population kinetics of the charge states explains the intensity-dependent absorption of x-ray photons and the fast modulation of XFEL pulses for both RSA and SA. © 2018 Author(s) | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Intensity-dependent resonant transmission of x-rays in solid-density aluminum plasma | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000433961800063 | - |
dc.identifier.scopusid | 2-s2.0-85046668168 | - |
dc.identifier.rimsid | 63904 | - |
dc.contributor.affiliatedAuthor | M. S. Cho | - |
dc.contributor.affiliatedAuthor | B. I. Cho | - |
dc.identifier.doi | 10.1063/1.5030472 | - |
dc.identifier.bibliographicCitation | PHYSICS OF PLASMAS, v.25, no.5, pp.0533010 | - |
dc.citation.title | PHYSICS OF PLASMAS | - |
dc.citation.volume | 25 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 0533010 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | FREE-ELECTRON LASER | - |
dc.subject.keywordPlus | 2-PHOTON ABSORPTION | - |
dc.subject.keywordPlus | MODEL | - |