Tribological Properties of Ultrananocrystalline Diamond Films in Inert and Reactive Tribo-Atmospheres: XPS Depth-Resolved Chemical Analysis

Abstract

Tribological properties of diamond films are sensitive to the chemically reactive and inert tribo-atmospheric media, and therefore, it is difficult to understand the underlying tribological mechanisms. In the present work, tribological properties of surface modified ultrananocrystalline diamond (UNCD) thin films were investigated in four distinct tribo-environmental conditions of ambient humid-atmosphere, nitrogen (N-2), argon (Ar), and methane (CH4) gases. The in situ depth-resolved X-ray photoelectron spectroscopy (XPS) showed the desorption of oxygen and oxy-functional additives and sputtering of weakly bonded amorphous carbon species from the UNCD film surface after the Art-ion sputtering process. After desorption of these chemical entities, friction and wear were decreased and run-in regime cycles became shorter in UNCD films. Friction in the ambient humid-atmosphere was higher compared to other tribo-environmental conditions, and it was explained by the oxidation mechanism of the sliding interfaces and the formation of the oxidized carbon transferfilm. However, low friction and wear in the N-2 atmosphere was associated with the adsorption of N-2 species, forming nitrogen-terminated carbon bonds at the sliding interfaces. This was directly investigated by XPS and energy dispersive X-ray spectroscopy techniques. Furthermore, low friction in the Ar atmosphere was explained by the physical adsorption of Ar gaseous species, which tend to avoid the covalent carbon bond formation across the sliding interfaces. Moreover, ultralow friction in the CH4 atmosphere was governed by the passivation of dangling carbon bonds by dissociative CH4 complexes, which creates hydrogen-terminated repulsive sliding interfaces. More importantly, a shorter run-in regime with low friction and wear in Art-ion sputtered UNCD films were explained by desorption of the oxygen and oxy-functional groups, which are inherently present in the UNCD films © 2018 American Chemical Society