Conceptual designs of a laser plasma accelerator-based EUV-FEL and an all-optical Gamma-beam source

Abstract

Recently, intense research into laser plasma accelerators has achieved great progress in the production of high-energy, high-quality electron beams with GeV-level energies in a cm-scale plasma. These electron beams open the door for broad applications in fundamental, medical, and industrial sciences. Here we present conceptual designs of an extreme ultraviolet radiation source for next-generation lithography and a laser Compton Gamma-beam source for nuclear physics research on a table-top scale, © Author(s) 2014. This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/ licences/by/3.0), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited. © Author(s) 2014