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Permeability- and Surface-Energy-Tunable Polyurethane Acrylate Molds for Capillary Force Lithography

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dc.contributor.authorDongchul Suh-
dc.contributor.authorHyowon Tak-
dc.contributor.authorSe-jin Choi-
dc.contributor.authorTae-il Kim-
dc.date.available2016-01-25T00:12:01Z-
dc.date.created2015-11-16-
dc.date.issued2015-11-
dc.identifier.issn1944-8244-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/2262-
dc.description.abstractA permeability- and surface-energy-controllable polyurethane acrylate (PUA) mold, a capillary-force material (CFM) mold, is introduced for capillary-force lithography (CFL). In CFL, the surface energy and gas permeability of the mold are crucial. However, the modulation of these two main factors at a time is difficult. Here, we introduce new CFM molds in which the surface energy and permeability can be modified by controlling the degree of cross-linking of the CFM. As the degree of cross-linking of the CFM mold increases, the surface energy and air permeability decrease. The high average functionality of the mold material makes it possible to produce patterns relatively finely and rapidly due to the high rate of capillary rise and stiffness, and the low functionality allows for patterns to form on a curved surface with conformal contact. CFMs with different functionality and controllable-interfacial properties will extend the capabilities of capillary force lithography to overcome the geometric limitations of patterning on a scale below 100 nm and micro- and nanopatterning on the curved region. © 2015 American Chemical Society-
dc.description.uri1-
dc.language영어-
dc.publisherAMER CHEMICAL SOC-
dc.subjectcapillary force lithography-
dc.subjectdegree of cross-linking-
dc.subjectmicro/nanostructure-
dc.subjectpermeability-
dc.subjectsurface energy-
dc.titlePermeability- and Surface-Energy-Tunable Polyurethane Acrylate Molds for Capillary Force Lithography-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000364355500002-
dc.identifier.scopusid2-s2.0-84946429709-
dc.identifier.rimsid21622ko
dc.date.tcdate2018-10-01-
dc.contributor.affiliatedAuthorHyowon Tak-
dc.contributor.affiliatedAuthorTae-il Kim-
dc.identifier.doi10.1021/acsami.5b06975-
dc.identifier.bibliographicCitationACS APPLIED MATERIALS & INTERFACES, v.7, no.43, pp.23824 - 23830-
dc.citation.titleACS APPLIED MATERIALS & INTERFACES-
dc.citation.volume7-
dc.citation.number43-
dc.citation.startPage23824-
dc.citation.endPage23830-
dc.date.scptcdate2018-10-01-
dc.description.wostc7-
dc.description.scptc7-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusSOFT LITHOGRAPHY-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordAuthorcapillary force lithography-
dc.subject.keywordAuthordegree of cross-linking-
dc.subject.keywordAuthorpermeability-
dc.subject.keywordAuthorsurface energy-
dc.subject.keywordAuthormicro/nanostructure-
Appears in Collections:
Center for Neuroscience Imaging Research (뇌과학 이미징 연구단) > 1. Journal Papers (저널논문)
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