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shin,seungwook
나노물질및화학반응연구단
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Studies on the controlling of the microstructural and morphological properties of Al doped ZnO thin films prepared by hydrothermal method

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dc.contributor.authorMyeng Gil Gang-
dc.contributor.authorSeung Wook Shin-
dc.contributor.authorK. V. Gurav-
dc.contributor.authorYinBo Wang-
dc.contributor.authorG. L. Agawane-
dc.contributor.authorJeong Yong Lee-
dc.contributor.authorJong-Ha Moon-
dc.contributor.authorJin Hyeok Kim-
dc.date.available2015-04-21T09:35:38Z-
dc.date.created2014-08-11-
dc.date.issued2013-10-
dc.identifier.issn0021-4922-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/1568-
dc.description.abstractAl doped ZnO (AZO) thin films were prepared on ZnO coated glass substrates by hydrothermal synthesis technique using aqueous solutions containing zinc nitrate hexahydrate, ammonium hydroxide, and different sodium citrate concentrations at 60 C for 6 h. The effects of different trisodium citrate concentrations on the microstructural, crystallinity, morphological, optical, and chemical properties of thin films were investigated. X-ray diffraction studies showed that the AZO thin films were grown as a polycrystalline wurtzite hexagonal phase with a c-axis preferred orientation and without an unwanted second phase regardless of trisodium citrate concentrations. The thickness and grain sizes of AZO thin films decreased with increasing trisodium citrate concentration. The microstructure of AZO thin films was changed from flat to needle shaped and the morphology was smoother with increasing trisodium citrate concentrations. The AZO thin films have a high transmittance in the visible region ranging from 75 to 85% and a sharp edge from 366 to 374 nm-
dc.description.uri1-
dc.language영어-
dc.publisherJAPAN SOC APPLIED PHYSICS-
dc.titleStudies on the controlling of the microstructural and morphological properties of Al doped ZnO thin films prepared by hydrothermal method-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000325946500006-
dc.identifier.scopusid2-s2.0-84887077148-
dc.identifier.rimsid505ko
dc.date.tcdate2018-10-01-
dc.contributor.affiliatedAuthorSeung Wook Shin-
dc.contributor.affiliatedAuthorJeong Yong Lee-
dc.identifier.doi10.7567/JJAP.52.10MA06-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.citation.volume52-
dc.citation.number10-
dc.date.scptcdate2018-10-01-
dc.description.wostc2-
dc.description.scptc2-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
Appears in Collections:
Center for Nanomaterials and Chemical Reactions(나노물질 및 화학반응 연구단) > 1. Journal Papers (저널논문)
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