Attojoule Hexagonal Boron Nitride-Based Memristor for High-Performance Neuromorphic Computing
DC Field | Value | Language |
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dc.contributor.author | Kim, Jiye | - |
dc.contributor.author | Song, Jaesub | - |
dc.contributor.author | Kwak, Hyunjoung | - |
dc.contributor.author | Chang-Won Choi | - |
dc.contributor.author | Noh, Kyungmi | - |
dc.contributor.author | Moon, Seokho | - |
dc.contributor.author | Hwang, Hyeonwoong | - |
dc.contributor.author | Hwang, Inyong | - |
dc.contributor.author | Jeong, Hokyeong | - |
dc.contributor.author | Si-Young Choi | - |
dc.contributor.author | Kim, Seyoung | - |
dc.contributor.author | Kim, Jong Kyu | - |
dc.date.accessioned | 2024-12-12T07:03:19Z | - |
dc.date.available | 2024-12-12T07:03:19Z | - |
dc.date.created | 2024-07-15 | - |
dc.date.issued | 2024-11 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/15586 | - |
dc.description.abstract | In next-generation neuromorphic computing applications, the primary challenge lies in achieving energy-efficient and reliable memristors while minimizing their energy consumption to a level comparable to that of biological synapses. In this work, hexagonal boron nitride (h-BN)-based metal-insulator-semiconductor (MIS) memristors operating is presented at the attojoule-level tailored for high-performance artificial neural networks. The memristors benefit from a wafer-scale uniform h-BN resistive switching medium grown directly on a highly doped Si wafer using metal-organic chemical vapor deposition (MOCVD), resulting in outstanding reliability and low variability. Notably, the h-BN-based memristors exhibit exceptionally low energy consumption of attojoule levels, coupled with fast switching speed. The switching mechanisms are systematically substantiated by electrical and nano-structural analysis, confirming that the h-BN layer facilitates the resistive switching with extremely low high resistance states (HRS) and the native SiOx on Si contributes to suppressing excessive current, enabling attojoule-level energy consumption. Furthermore, the formation of atomic-scale conductive filaments leads to remarkably fast response times within the nanosecond range, and allows for the attainment of multi-resistance states, making these memristors well-suited for next-generation neuromorphic applications. The h-BN-based MIS memristors hold the potential to revolutionize energy consumption limitations in neuromorphic devices, bridging the gap between artificial and biological synapses. This article presents wafer-scale hexagonal boron nitride (h-BN)-based memristors with metal-insulator-semiconductor (MIS) configuration, operating at the attojoule level. These h-BN-based memristors are the first to demonstrate multi-states in response to nanosecond stimuli among existing 2D materials-based memristors. The h-BN-based memristors have the potential to revolutionize the current challenges in neuromorphic applications, bridging the energy efficiency gap between artificial and biological synapses. image | - |
dc.language | 영어 | - |
dc.publisher | Wiley - V C H Verlag GmbbH & Co. | - |
dc.title | Attojoule Hexagonal Boron Nitride-Based Memristor for High-Performance Neuromorphic Computing | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 001258516100001 | - |
dc.identifier.scopusid | 2-s2.0-85197466307 | - |
dc.identifier.rimsid | 83524 | - |
dc.contributor.affiliatedAuthor | Chang-Won Choi | - |
dc.contributor.affiliatedAuthor | Si-Young Choi | - |
dc.identifier.doi | 10.1002/smll.202403737 | - |
dc.identifier.bibliographicCitation | Small, v.20, no.45 | - |
dc.relation.isPartOf | Small | - |
dc.citation.title | Small | - |
dc.citation.volume | 20 | - |
dc.citation.number | 45 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | WAFER-SCALE | - |
dc.subject.keywordPlus | MEMORY | - |
dc.subject.keywordPlus | CONDUCTANCE | - |
dc.subject.keywordPlus | RRAM | - |
dc.subject.keywordPlus | GRAPHENE | - |
dc.subject.keywordPlus | BARRIER | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | CROSSBAR ARRAYS | - |
dc.subject.keywordAuthor | metal-organic chemical vapor deposition | - |
dc.subject.keywordAuthor | neuromorphic application | - |
dc.subject.keywordAuthor | attojoule energy consumption | - |
dc.subject.keywordAuthor | hexagonal boron nitride | - |
dc.subject.keywordAuthor | memristor | - |