Unraveling Chemical Interactions between Titanium and Graphene for Electrical Contact Applications
DC Field | Value | Language |
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dc.contributor.author | Freedy, K.M. | - |
dc.contributor.author | Beechem, T.E. | - |
dc.contributor.author | Litwin, P.M. | - |
dc.contributor.author | Sales, M.G. | - |
dc.contributor.author | Ming Huang | - |
dc.contributor.author | Rodney S. Ruof | - |
dc.contributor.author | McDonnell, S.J. | - |
dc.date.accessioned | 2023-09-25T22:00:46Z | - |
dc.date.available | 2023-09-25T22:00:46Z | - |
dc.date.created | 2022-07-25 | - |
dc.date.issued | 2018-09 | - |
dc.identifier.issn | 2574-0970 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/13972 | - |
dc.description.abstract | The chemical interaction between Ti and graphene is of significant interest for engineering low-resistance electrical contacts. To study the interface chemistry, sequential depositions of Ti are performed on both as-received and ultrahigh-vacuum (UHV)-annealed chemical-vapor-deposition-grown graphene samples. In situ X-ray photoelectron spectroscopy (XPS) reveals no experimental evidence for the reaction of Ti with graphene at room temperature or after heating to 500 °C. The presence of the TiC chemical state is instead attributed to reactions between Ti and background gases in the UHV chamber as well as adventitious C on the surface of the graphene sample. We find that surface contamination can be substantially reduced by annealing in UHV. The deposition of Ti on graphene results in n-type doping, which manifests in core-level shifts and broadening of the graphene C 1s peak. Annealing the sample following the deposition of Ti reverses the n-type doping. The Raman spectroscopy results are in agreement with XPS analysis, which together provide insight into the possible mechanisms driving the changes in graphene doping. © 2018 American Chemical Society. | - |
dc.language | 영어 | - |
dc.publisher | American Chemical Society | - |
dc.title | Unraveling Chemical Interactions between Titanium and Graphene for Electrical Contact Applications | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000461401000048 | - |
dc.identifier.scopusid | 2-s2.0-85072513409 | - |
dc.identifier.rimsid | 78571 | - |
dc.contributor.affiliatedAuthor | Ming Huang | - |
dc.contributor.affiliatedAuthor | Rodney S. Ruof | - |
dc.identifier.doi | 10.1021/acsanm.8b01024 | - |
dc.identifier.bibliographicCitation | ACS Applied Nano Materials, v.1, no.9, pp.4828 - 4835 | - |
dc.relation.isPartOf | ACS Applied Nano Materials | - |
dc.citation.title | ACS Applied Nano Materials | - |
dc.citation.volume | 1 | - |
dc.citation.number | 9 | - |
dc.citation.startPage | 4828 | - |
dc.citation.endPage | 4835 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | graphene | - |
dc.subject.keywordAuthor | interface reactions | - |
dc.subject.keywordAuthor | Raman spectroscopy | - |
dc.subject.keywordAuthor | ultrahigh-vacuum deposition | - |
dc.subject.keywordAuthor | X-ray photoelectron spectroscopy | - |