Directed self-assembly of block copolymers for next generation nanolithography
DC Field | Value | Language |
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dc.contributor.author | Seong-Jun Jeong | - |
dc.contributor.author | Ju Young Kim | - |
dc.contributor.author | Bong Hoon Kim | - |
dc.contributor.author | Hyoung-Seok Moon | - |
dc.contributor.author | Sang Ouk Kim | - |
dc.date.available | 2015-04-20T06:30:35Z | - |
dc.date.created | 2014-10-30 | ko |
dc.date.issued | 2013-12 | - |
dc.identifier.issn | 1369-7021 | - |
dc.identifier.uri | https://pr.ibs.re.kr/handle/8788114/1193 | - |
dc.description.abstract | Directed self-assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. In this review, we highlight the recent progress in the development of the directed self-assembly process for practical utilization in semiconductor applications. Various advanced directed self-assembly approaches are examined, in which block copolymer self-assembly is synergistically integrated with conventional photolithography, such as ArF lithography or I-line lithography, via either epitaxial self-assembly or the graphoepitaxy principle. We focus on the practical advantages anticipated from directed self-assembly integration, such as pattern density multiplication, feature size uniformity improvement, line edge roughness reduction, as well as cost reduction. Additionally, a direction for future research on directed self-assembly is suggested with diverse potential applications. | - |
dc.description.uri | 1 | - |
dc.language | 영어 | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.title | Directed self-assembly of block copolymers for next generation nanolithography | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.identifier.wosid | 000328640100015 | - |
dc.identifier.scopusid | 2-s2.0-84890392162 | - |
dc.identifier.rimsid | 15072 | ko |
dc.date.tcdate | 2018-10-01 | - |
dc.contributor.affiliatedAuthor | Ju Young Kim | - |
dc.contributor.affiliatedAuthor | Hyoung-Seok Moon | - |
dc.contributor.affiliatedAuthor | Sang Ouk Kim | - |
dc.identifier.doi | 10.1016/j.mattod.2013.11.002 | - |
dc.identifier.bibliographicCitation | MATERIALS TODAY, v.16, no.12, pp.468 - 476 | - |
dc.citation.title | MATERIALS TODAY | - |
dc.citation.volume | 16 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 468 | - |
dc.citation.endPage | 476 | - |
dc.date.scptcdate | 2018-10-01 | - |
dc.description.wostc | 102 | - |
dc.description.scptc | 118 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |