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강상관계물질연구단
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Controllable Thickness Inhomogeneity and Berry Curvature Engineering of Anomalous Hall Effect in SrRuO3 Ultrathin Films

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dc.contributor.authorLingfei Wang-
dc.contributor.authorQiyuan Feng-
dc.contributor.authorHan Gyeol Lee-
dc.contributor.authorEun Kyo Ko-
dc.contributor.authorQingyou Lu-
dc.contributor.authorTae Won Noh-
dc.date.available2020-04-09T05:39:29Z-
dc.date.created2020-04-01-
dc.date.issued2020-04-
dc.identifier.issn1530-6984-
dc.identifier.urihttps://pr.ibs.re.kr/handle/8788114/7095-
dc.description.abstractIn quantum matters hosting electron−electron correlation and spin−orbit coupling, spatial inhomogeneities, arising from competing ground states, can be essential for understanding exotic topological properties. A prominent example is Hall anomalies observed in SrRuO 3 films, which were interpreted in terms of either magnetic skyrmion-induced topological Hall effect or inhomogeneous anomalous Hall effect (AHE). To clarify this ambiguity, we systematically investigated the evolution of AHE with controllable inhomogeneities in SrRuO 3 film thickness (t SRO ). By exploiting the step-flow growth of SrRuO 3 films, we induced a microscopically ordered stripe pattern with one-unit-cell differences in t SRO . The associated spatial distribution of momentum-space Berry curvatures enables a two-channel AHE with hump-like Hall anomalies, which can be continuously engineered according to non-integer t SRO . We further microscopically characterized the stripe-like ferromagnetic domains and two-step magnetic switching behavior in the inhomogeneous SrRuO 3 film. These unique features can be utilized to identify the two-channel AHE model and understand its microscopic origin. © 2020 American Chemical Society-
dc.description.uri1-
dc.language영어-
dc.publisherAMER CHEMICAL SOC-
dc.titleControllable Thickness Inhomogeneity and Berry Curvature Engineering of Anomalous Hall Effect in SrRuO3 Ultrathin Films-
dc.typeArticle-
dc.type.rimsART-
dc.identifier.wosid000526413400031-
dc.identifier.scopusid2-s2.0-85083003256-
dc.identifier.rimsid71724-
dc.contributor.affiliatedAuthorLingfei Wang-
dc.contributor.affiliatedAuthorHan Gyeol Lee-
dc.contributor.affiliatedAuthorTae Won Noh-
dc.identifier.doi10.1021/acs.nanolett.9b05206-
dc.identifier.bibliographicCitationNANO LETTERS, v.20, no.4, pp.2468 - 2477-
dc.citation.titleNANO LETTERS-
dc.citation.volume20-
dc.citation.number4-
dc.citation.startPage2468-
dc.citation.endPage2477-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
Appears in Collections:
Center for Correlated Electron Systems(강상관계 물질 연구단) > 1. Journal Papers (저널논문)
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