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Sheet resistance variation of graphene grown on annealed and mechanically polished Cu films

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Title
Sheet resistance variation of graphene grown on annealed and mechanically polished Cu films
Author(s)
Jong-Kwon Lee; Chang-Soo Park; Heetae Kim
Publication Date
2014-11
Journal
RSC ADVANCES, v.4, no.107, pp.62453 - 62456
Publisher
ROYAL SOC CHEMISTRY
Abstract
Graphene was grown on a Cu film, processed by annealing and mechanical polishing. The sheet resistance of graphene shows 57% decrease by mechanical polishing for raw Cu and 20% decrease by annealing for 50 nm SiO2 polishing.
URI
http://pr.ibs.re.kr/handle/8788114/2939
DOI
10.1039/c4ra11734d
ISSN
2046-2069
Appears in Collections:
HiddenCommunity > Journal Papers
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