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Solvent-free microfabrication of thin film device using the focused ion beam

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Title
Solvent-free microfabrication of thin film device using the focused ion beam
Author(s)
Hoseong Jeon; Song, Sehwan; Park, Sungkyun; Jun Sung Kim; Ok, Jong Mok
Publication Date
2024-07
Journal
Current Applied Physics, v.63, pp.1 - 6
Publisher
The Korean Physical Society
Abstract
We introduce a novel fabrication technique for thin film devices, utilizing Focused Ion Beam micro-machining. Unlike conventional methods requiring post processes such as etching or solvent treatment, this method involves creating a pre-patterning step-like structure on the substrate before growing the thin film, achieving the desired device pattern right after thin film deposition. As an example, we fabricated devices with VO2 thin film of which electrical transport properties are examined. The VO2 devices exhibit robust metal-insulator transition behavior and V-I characteristics, indicating the high quality of the patterned devices. The results indicate that our approach enables intricate patterning, comparable to conventional e-beam lithography, without the risk of sample degradation. The simplicity, stability, and versatility of this technique suggest new possibilities for thin film device fabrication. © 2024 Korean Physical Society
URI
https://pr.ibs.re.kr/handle/8788114/15149
DOI
10.1016/j.cap.2024.03.014
ISSN
1567-1739
Appears in Collections:
Center for Artificial Low Dimensional Electronic Systems(원자제어 저차원 전자계 연구단) > 1. Journal Papers (저널논문)
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