Browsing byAuthor : um,dooseung
Showing results 1 to 3 of 3
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Publication Date2021-09
BCl3/Ar plasma etching for the performance enhancement of Al-doped ZnO thin films
Joo, Young-Hee; Jin, Mi-Jin; Sung Kyun Kim, et al
Applied Surface Science, v.561
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Publication Date2023-12
Reducing the oxygen vacancy concentration in SrTiO3-δ thin films via an optimized O2 plasma treatment for enhancing device properties
Ji-Yeop Kim; Mi-Jin Jin; Hou, Bo, et al
Applied Surface Science, v.639
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Publication Date2024-04
Transition of Cu film to Cu2O film through oxygen plasma treatment
Liu, Qiang; Kim, Ji-Yeop; Mi-Jin Jin, et al
Materials Chemistry and Physics, v.316
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